JPS5462839A - Thin film heat sensitive head - Google Patents

Thin film heat sensitive head

Info

Publication number
JPS5462839A
JPS5462839A JP13003077A JP13003077A JPS5462839A JP S5462839 A JPS5462839 A JP S5462839A JP 13003077 A JP13003077 A JP 13003077A JP 13003077 A JP13003077 A JP 13003077A JP S5462839 A JPS5462839 A JP S5462839A
Authority
JP
Japan
Prior art keywords
layer
resistors
entire surface
layers
thin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13003077A
Other languages
Japanese (ja)
Inventor
Takeji Fujiwara
Koichi Hamanaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP13003077A priority Critical patent/JPS5462839A/en
Publication of JPS5462839A publication Critical patent/JPS5462839A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To enable printing of good sharpness to be obtained by forming abrasion resistant layers mutually independently together with thin film resistors thereby thermally separating them in the thin-film heat sensitive head of a thermal printer.
CONSTITUTION: A glaze layer 2, thin-film resistors 3, electrodes 4 for current supplying to the resistors 3 and an oxidation resistant layer 5 evenly covering the entire surface are provided on one side of a substrate 1 such as alumina. Next, a Ta metal layer 7 is formed over the entire surface by a sputtering process or the like and further a photo resist film is formed over the entire surface thereof. Next, the photo resist film of the portions opposing to the resistors 3 is removed by photomechanical techniques and in this state the layer 7 is oxidized to Ta2O5 down to a required depth by an anodic oxidation process, whereby abrasion resistant layers 6 are formed. Next, with the layers 6 as a mask, the remaining layers 6 where Ta2O5 has not been formed are etched away by a Ta layer etching solution of NH4F-NHO3 base.
COPYRIGHT: (C)1979,JPO&Japio
JP13003077A 1977-10-28 1977-10-28 Thin film heat sensitive head Pending JPS5462839A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13003077A JPS5462839A (en) 1977-10-28 1977-10-28 Thin film heat sensitive head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13003077A JPS5462839A (en) 1977-10-28 1977-10-28 Thin film heat sensitive head

Publications (1)

Publication Number Publication Date
JPS5462839A true JPS5462839A (en) 1979-05-21

Family

ID=15024406

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13003077A Pending JPS5462839A (en) 1977-10-28 1977-10-28 Thin film heat sensitive head

Country Status (1)

Country Link
JP (1) JPS5462839A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56126181A (en) * 1980-03-10 1981-10-02 Nec Corp Heat-sensitive recording head

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56126181A (en) * 1980-03-10 1981-10-02 Nec Corp Heat-sensitive recording head
JPH0152188B2 (en) * 1980-03-10 1989-11-08 Nippon Electric Co

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