JPS5772330A - Plasma etching - Google Patents

Plasma etching

Info

Publication number
JPS5772330A
JPS5772330A JP14858580A JP14858580A JPS5772330A JP S5772330 A JPS5772330 A JP S5772330A JP 14858580 A JP14858580 A JP 14858580A JP 14858580 A JP14858580 A JP 14858580A JP S5772330 A JPS5772330 A JP S5772330A
Authority
JP
Japan
Prior art keywords
processed
substrates
top end
substrate
conductive board
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP14858580A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0131292B2 (OSRAM
Inventor
Hisao Haruyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP14858580A priority Critical patent/JPS5772330A/ja
Publication of JPS5772330A publication Critical patent/JPS5772330A/ja
Publication of JPH0131292B2 publication Critical patent/JPH0131292B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)
JP14858580A 1980-10-23 1980-10-23 Plasma etching Granted JPS5772330A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14858580A JPS5772330A (en) 1980-10-23 1980-10-23 Plasma etching

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14858580A JPS5772330A (en) 1980-10-23 1980-10-23 Plasma etching

Publications (2)

Publication Number Publication Date
JPS5772330A true JPS5772330A (en) 1982-05-06
JPH0131292B2 JPH0131292B2 (OSRAM) 1989-06-26

Family

ID=15456029

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14858580A Granted JPS5772330A (en) 1980-10-23 1980-10-23 Plasma etching

Country Status (1)

Country Link
JP (1) JPS5772330A (OSRAM)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1986002289A1 (en) * 1984-10-19 1986-04-24 Tetron, Inc. Reactor apparatus for semiconductor wafer processing

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5021218A (OSRAM) * 1973-06-29 1975-03-06

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5021218A (OSRAM) * 1973-06-29 1975-03-06

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1986002289A1 (en) * 1984-10-19 1986-04-24 Tetron, Inc. Reactor apparatus for semiconductor wafer processing
US4694779A (en) * 1984-10-19 1987-09-22 Tetron, Inc. Reactor apparatus for semiconductor wafer processing

Also Published As

Publication number Publication date
JPH0131292B2 (OSRAM) 1989-06-26

Similar Documents

Publication Publication Date Title
JPS5751290A (en) Electrolytic treatment of beltlike metallic plate
JPS5772330A (en) Plasma etching
JPS5555530A (en) Electrode device for plasma processor
JPS5545501A (en) Soldering tool
JPS5559741A (en) Preparation of semiconductor device
JPS5335994A (en) Fitting metal for wiring apparatus
JPS5591842A (en) Manufacture of semiconductor device
JPS5437581A (en) Wafer etching device
JPS648695A (en) Printed circuit board processor
JPS5569266A (en) Selective adhering method of metal
JPS5496366A (en) Semiconductor device
JPS6484224A (en) Electrode forming method
JPH03285098A (ja) 電気めっき装置
JPS5554574A (en) Plasma etching apparatus
JPS6473723A (en) Semiconductor processor
JPS5574140A (en) Termination detecting method of insulating film etching
JPS5741395A (en) Electroplating method
JPS5750454A (en) Etching for soldered electrode
JPS54103760A (en) Electric welding
JPS57114690A (en) Method and device for plating
JPS5711450A (en) Manufacture of fluorescent display tube
JPS545386A (en) Surface processor for wafer
JPS5776187A (en) Treatment by etching
JPS56137638A (en) Dry etching method and its device
JPS56110230A (en) Forming method of electrode on semiconductor device