JPS576849A - Photomask and its preparation - Google Patents
Photomask and its preparationInfo
- Publication number
- JPS576849A JPS576849A JP8059880A JP8059880A JPS576849A JP S576849 A JPS576849 A JP S576849A JP 8059880 A JP8059880 A JP 8059880A JP 8059880 A JP8059880 A JP 8059880A JP S576849 A JPS576849 A JP S576849A
- Authority
- JP
- Japan
- Prior art keywords
- pattern
- film
- light shielding
- silicon dioxide
- light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8059880A JPS576849A (en) | 1980-06-13 | 1980-06-13 | Photomask and its preparation |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8059880A JPS576849A (en) | 1980-06-13 | 1980-06-13 | Photomask and its preparation |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS576849A true JPS576849A (en) | 1982-01-13 |
JPS6161375B2 JPS6161375B2 (ja) | 1986-12-25 |
Family
ID=13722757
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8059880A Granted JPS576849A (en) | 1980-06-13 | 1980-06-13 | Photomask and its preparation |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS576849A (ja) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0090924A2 (en) * | 1982-04-05 | 1983-10-12 | International Business Machines Corporation | Method of increasing the image resolution of a transmitting mask and improved masks for performing the method |
JPS63194250A (ja) * | 1987-02-07 | 1988-08-11 | Hitachi Ltd | ホトレジストパターンの形成方法 |
US5358807A (en) * | 1988-11-22 | 1994-10-25 | Hitachi, Ltd. | Mask for manufacturing semiconductor device and method of manufacture thereof |
US5389474A (en) * | 1990-04-19 | 1995-02-14 | Sharp Kabushiki Kaisha | Mask for photolithography |
JP2008310092A (ja) * | 2007-06-15 | 2008-12-25 | Shin Etsu Chem Co Ltd | フォトマスク |
JP2008311462A (ja) * | 2007-06-15 | 2008-12-25 | Shin Etsu Chem Co Ltd | パターン転写方法およびフォトマスク |
JP2011253209A (ja) * | 2011-09-21 | 2011-12-15 | Shin Etsu Chem Co Ltd | パターン転写方法およびフォトマスク |
-
1980
- 1980-06-13 JP JP8059880A patent/JPS576849A/ja active Granted
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0090924A2 (en) * | 1982-04-05 | 1983-10-12 | International Business Machines Corporation | Method of increasing the image resolution of a transmitting mask and improved masks for performing the method |
JPS63194250A (ja) * | 1987-02-07 | 1988-08-11 | Hitachi Ltd | ホトレジストパターンの形成方法 |
US5358807A (en) * | 1988-11-22 | 1994-10-25 | Hitachi, Ltd. | Mask for manufacturing semiconductor device and method of manufacture thereof |
US6733933B2 (en) | 1988-11-22 | 2004-05-11 | Renesas Technology Corporation | Mask for manufacturing semiconductor device and method of manufacture thereof |
US5389474A (en) * | 1990-04-19 | 1995-02-14 | Sharp Kabushiki Kaisha | Mask for photolithography |
JP2008310092A (ja) * | 2007-06-15 | 2008-12-25 | Shin Etsu Chem Co Ltd | フォトマスク |
JP2008311462A (ja) * | 2007-06-15 | 2008-12-25 | Shin Etsu Chem Co Ltd | パターン転写方法およびフォトマスク |
JP2011253209A (ja) * | 2011-09-21 | 2011-12-15 | Shin Etsu Chem Co Ltd | パターン転写方法およびフォトマスク |
Also Published As
Publication number | Publication date |
---|---|
JPS6161375B2 (ja) | 1986-12-25 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS576849A (en) | Photomask and its preparation | |
JPS5630129A (en) | Manufacture of photomask | |
JPS56118606A (en) | Metal scale and manufacture thereof | |
JPS576848A (en) | Photomask and its preparation | |
JPS5580323A (en) | Pattern forming method for photoresist-film | |
JPS53110379A (en) | Optical filter and its manufacture | |
JPS5596952A (en) | Production of photomask | |
JPS57212445A (en) | Production of photomask | |
JPS5339060A (en) | Lot number marking method to wafers | |
JPS5670553A (en) | Photomask for projection exposure | |
JPS5437579A (en) | Chrome plate | |
JPS5421273A (en) | Manufacture for photo mask | |
JPS6450423A (en) | Formation of resist-pattern | |
JPS5550627A (en) | Mask for lithography | |
JPS5752056A (en) | Photomask | |
JPS6472163A (en) | Formation of thin film pattern | |
JPS5534437A (en) | Method of forming minute pattern | |
JPS5555528A (en) | Mask aligner | |
JPS544077A (en) | Photo mask for far ultraviolet ray exposure | |
JPS54121150A (en) | Optical production of blaze grating | |
JPS5655950A (en) | Photographic etching method | |
JPS5464476A (en) | Exposing method | |
JPS5360177A (en) | Photo mask | |
JPS56110232A (en) | Pattern formation with soft x-ray | |
JPS5767930A (en) | Photomask |