JPS5750432A - Drawing method by electron beam - Google Patents

Drawing method by electron beam

Info

Publication number
JPS5750432A
JPS5750432A JP12681380A JP12681380A JPS5750432A JP S5750432 A JPS5750432 A JP S5750432A JP 12681380 A JP12681380 A JP 12681380A JP 12681380 A JP12681380 A JP 12681380A JP S5750432 A JPS5750432 A JP S5750432A
Authority
JP
Japan
Prior art keywords
signals
slippage
electron
amount
drawn
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12681380A
Other languages
English (en)
Other versions
JPS631742B2 (ja
Inventor
Teruaki Okino
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Nippon Telegraph and Telephone Corp
Original Assignee
Jeol Ltd
Nihon Denshi KK
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd, Nihon Denshi KK, Nippon Telegraph and Telephone Corp filed Critical Jeol Ltd
Priority to JP12681380A priority Critical patent/JPS5750432A/ja
Publication of JPS5750432A publication Critical patent/JPS5750432A/ja
Publication of JPS631742B2 publication Critical patent/JPS631742B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304Controlling tubes by information coming from the objects or from the beam, e.g. correction signals

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
JP12681380A 1980-09-12 1980-09-12 Drawing method by electron beam Granted JPS5750432A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12681380A JPS5750432A (en) 1980-09-12 1980-09-12 Drawing method by electron beam

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12681380A JPS5750432A (en) 1980-09-12 1980-09-12 Drawing method by electron beam

Publications (2)

Publication Number Publication Date
JPS5750432A true JPS5750432A (en) 1982-03-24
JPS631742B2 JPS631742B2 (ja) 1988-01-13

Family

ID=14944588

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12681380A Granted JPS5750432A (en) 1980-09-12 1980-09-12 Drawing method by electron beam

Country Status (1)

Country Link
JP (1) JPS5750432A (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5982725A (ja) * 1982-11-04 1984-05-12 Hitachi Ltd 電子線描画装置

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5359373A (en) * 1976-11-09 1978-05-29 Fujitsu Ltd Electron beam exposure unit
JPS5580321A (en) * 1978-12-11 1980-06-17 Fujitsu Ltd Electron-beam exposure

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5359373A (en) * 1976-11-09 1978-05-29 Fujitsu Ltd Electron beam exposure unit
JPS5580321A (en) * 1978-12-11 1980-06-17 Fujitsu Ltd Electron-beam exposure

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5982725A (ja) * 1982-11-04 1984-05-12 Hitachi Ltd 電子線描画装置

Also Published As

Publication number Publication date
JPS631742B2 (ja) 1988-01-13

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