JPS5359373A - Electron beam exposure unit - Google Patents

Electron beam exposure unit

Info

Publication number
JPS5359373A
JPS5359373A JP13454976A JP13454976A JPS5359373A JP S5359373 A JPS5359373 A JP S5359373A JP 13454976 A JP13454976 A JP 13454976A JP 13454976 A JP13454976 A JP 13454976A JP S5359373 A JPS5359373 A JP S5359373A
Authority
JP
Japan
Prior art keywords
exposure unit
electron beam
beam exposure
memory means
signals
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP13454976A
Other languages
Japanese (ja)
Other versions
JPS5846847B2 (en
Inventor
Hiroshi Yasuda
Haruo Tsuchikawa
Kenichi Kawashima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP51134549A priority Critical patent/JPS5846847B2/en
Publication of JPS5359373A publication Critical patent/JPS5359373A/en
Publication of JPS5846847B2 publication Critical patent/JPS5846847B2/en
Expired legal-status Critical Current

Links

Landscapes

  • Electron Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE: To make the stage moving distance of an exposure unit accurate by storing the distortion quantity of the mirror reflecting laser beam in a memory means and correcting the deflecting signals or signals from laser interference measuring equipment by the signal indicating the distortion quantity which is outputted from memory means.
COPYRIGHT: (C)1978,JPO&Japio
JP51134549A 1976-11-09 1976-11-09 Electron beam exposure equipment Expired JPS5846847B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP51134549A JPS5846847B2 (en) 1976-11-09 1976-11-09 Electron beam exposure equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP51134549A JPS5846847B2 (en) 1976-11-09 1976-11-09 Electron beam exposure equipment

Publications (2)

Publication Number Publication Date
JPS5359373A true JPS5359373A (en) 1978-05-29
JPS5846847B2 JPS5846847B2 (en) 1983-10-19

Family

ID=15130903

Family Applications (1)

Application Number Title Priority Date Filing Date
JP51134549A Expired JPS5846847B2 (en) 1976-11-09 1976-11-09 Electron beam exposure equipment

Country Status (1)

Country Link
JP (1) JPS5846847B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5750432A (en) * 1980-09-12 1982-03-24 Jeol Ltd Drawing method by electron beam

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5750432A (en) * 1980-09-12 1982-03-24 Jeol Ltd Drawing method by electron beam
JPS631742B2 (en) * 1980-09-12 1988-01-13 Nippon Electron Optics Lab

Also Published As

Publication number Publication date
JPS5846847B2 (en) 1983-10-19

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