JPS5745946A - Relative position detecting pattern - Google Patents
Relative position detecting patternInfo
- Publication number
- JPS5745946A JPS5745946A JP55121512A JP12151280A JPS5745946A JP S5745946 A JPS5745946 A JP S5745946A JP 55121512 A JP55121512 A JP 55121512A JP 12151280 A JP12151280 A JP 12151280A JP S5745946 A JPS5745946 A JP S5745946A
- Authority
- JP
- Japan
- Prior art keywords
- patterns
- layer
- pattern
- relative position
- absence
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000006073 displacement reaction Methods 0.000 abstract 2
- 229910021420 polycrystalline silicon Inorganic materials 0.000 abstract 2
- 229920005591 polysilicon Polymers 0.000 abstract 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 abstract 1
- 229910052782 aluminium Inorganic materials 0.000 abstract 1
- 239000004065 semiconductor Substances 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/544—Marks applied to semiconductor devices or parts, e.g. registration marks, alignment structures, wafer maps
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2223/00—Details relating to semiconductor or other solid state devices covered by the group H01L23/00
- H01L2223/544—Marks applied to semiconductor devices or parts
- H01L2223/54453—Marks applied to semiconductor devices or parts for use prior to dicing
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Control Of Position Or Direction (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP55121512A JPS5745946A (en) | 1980-09-02 | 1980-09-02 | Relative position detecting pattern |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP55121512A JPS5745946A (en) | 1980-09-02 | 1980-09-02 | Relative position detecting pattern |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5745946A true JPS5745946A (en) | 1982-03-16 |
JPS622458B2 JPS622458B2 (enrdf_load_stackoverflow) | 1987-01-20 |
Family
ID=14813029
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP55121512A Granted JPS5745946A (en) | 1980-09-02 | 1980-09-02 | Relative position detecting pattern |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5745946A (enrdf_load_stackoverflow) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63112657U (enrdf_load_stackoverflow) * | 1987-01-17 | 1988-07-20 | ||
US5504999A (en) * | 1992-12-07 | 1996-04-09 | Read-Rite Corporation | Method and apparatus for compensating for process variations in an automatic positioning system |
US5627083A (en) * | 1993-08-03 | 1997-05-06 | Nec Corporation | Method of fabricating semiconductor device including step of forming superposition error measuring patterns |
WO2002082531A3 (en) * | 2001-04-05 | 2003-02-27 | Infineon Technologies Corp | Structure and method for determining edges of regions in a semiconductor wafer |
JP2004532677A (ja) * | 2001-04-13 | 2004-10-28 | ベクトン・ディキンソン・アンド・カンパニー | 皮内針 |
WO2011040188A1 (ja) * | 2009-09-30 | 2011-04-07 | テルモ株式会社 | 注射補助具及び薬剤注射装置 |
US9381310B2 (en) | 2010-03-10 | 2016-07-05 | Terumo Kabushiki Kaisha | Injection needle assembly and drug injection apparatus |
-
1980
- 1980-09-02 JP JP55121512A patent/JPS5745946A/ja active Granted
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63112657U (enrdf_load_stackoverflow) * | 1987-01-17 | 1988-07-20 | ||
US5504999A (en) * | 1992-12-07 | 1996-04-09 | Read-Rite Corporation | Method and apparatus for compensating for process variations in an automatic positioning system |
US5627083A (en) * | 1993-08-03 | 1997-05-06 | Nec Corporation | Method of fabricating semiconductor device including step of forming superposition error measuring patterns |
WO2002082531A3 (en) * | 2001-04-05 | 2003-02-27 | Infineon Technologies Corp | Structure and method for determining edges of regions in a semiconductor wafer |
US6828647B2 (en) | 2001-04-05 | 2004-12-07 | Infineon Technologies Ag | Structure for determining edges of regions in a semiconductor wafer |
JP2004532677A (ja) * | 2001-04-13 | 2004-10-28 | ベクトン・ディキンソン・アンド・カンパニー | 皮内針 |
JP4883877B2 (ja) * | 2001-04-13 | 2012-02-22 | ベクトン・ディキンソン・アンド・カンパニー | 皮内針 |
WO2011040188A1 (ja) * | 2009-09-30 | 2011-04-07 | テルモ株式会社 | 注射補助具及び薬剤注射装置 |
US9381310B2 (en) | 2010-03-10 | 2016-07-05 | Terumo Kabushiki Kaisha | Injection needle assembly and drug injection apparatus |
Also Published As
Publication number | Publication date |
---|---|
JPS622458B2 (enrdf_load_stackoverflow) | 1987-01-20 |
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