JPS5735937A - Purazumakagakuhannoho - Google Patents

Purazumakagakuhannoho

Info

Publication number
JPS5735937A
JPS5735937A JP10996080A JP10996080A JPS5735937A JP S5735937 A JPS5735937 A JP S5735937A JP 10996080 A JP10996080 A JP 10996080A JP 10996080 A JP10996080 A JP 10996080A JP S5735937 A JPS5735937 A JP S5735937A
Authority
JP
Japan
Prior art keywords
raw material
gas
reactions
plasma chemical
gases
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10996080A
Other languages
English (en)
Inventor
Katsuhiro Hirata
Hisao Yakushiji
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP10996080A priority Critical patent/JPS5735937A/ja
Publication of JPS5735937A publication Critical patent/JPS5735937A/ja
Pending legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J19/087Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
    • B01J19/088Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Chemical Vapour Deposition (AREA)
JP10996080A 1980-08-08 1980-08-08 Purazumakagakuhannoho Pending JPS5735937A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10996080A JPS5735937A (ja) 1980-08-08 1980-08-08 Purazumakagakuhannoho

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10996080A JPS5735937A (ja) 1980-08-08 1980-08-08 Purazumakagakuhannoho

Publications (1)

Publication Number Publication Date
JPS5735937A true JPS5735937A (ja) 1982-02-26

Family

ID=14523495

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10996080A Pending JPS5735937A (ja) 1980-08-08 1980-08-08 Purazumakagakuhannoho

Country Status (1)

Country Link
JP (1) JPS5735937A (ja)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58199857A (ja) * 1982-05-04 1983-11-21 マイクル・ポ−ル・ニアリ− 化学的方法
JPS59104120A (ja) * 1982-12-07 1984-06-15 Fujitsu Ltd プラズマ処理方法
JPS6027767A (ja) * 1983-07-27 1985-02-12 Suzuki Motor Co Ltd 気化器の燃料調節装置
JPS6027122A (ja) * 1983-07-22 1985-02-12 Semiconductor Energy Lab Co Ltd 光プラズマ気相反応法

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58199857A (ja) * 1982-05-04 1983-11-21 マイクル・ポ−ル・ニアリ− 化学的方法
JPS59104120A (ja) * 1982-12-07 1984-06-15 Fujitsu Ltd プラズマ処理方法
JPS6027122A (ja) * 1983-07-22 1985-02-12 Semiconductor Energy Lab Co Ltd 光プラズマ気相反応法
JPS6027767A (ja) * 1983-07-27 1985-02-12 Suzuki Motor Co Ltd 気化器の燃料調節装置

Similar Documents

Publication Publication Date Title
GB9322966D0 (en) Method for making a semiconductor and apparatus for the same
DE69523488D1 (de) Verfahren und Vorrichtung zum Zünden von Plasmen in einem Process modul
US5214002A (en) Process for depositing a thermal CVD film of Si or Ge using a hydrogen post-treatment step and an optional hydrogen pre-treatment step
DE3867539D1 (de) Verfahren zur herstellung von polykristallinem silicium sehr hoher reinheit.
SE8902391D0 (sv) Foerfarande jaemte anordning foer att behandla kiselplattor
JPS5735937A (ja) Purazumakagakuhannoho
ATE93082T1 (de) Solarzellen auf der basis von cuins2 und verfahren zu deren herstellung.
JPS5684462A (en) Plasma nitriding method
EP0429814A3 (en) Process and apparatus for initiating and/or promoting chemical processes
Tachibana Diagnostics and control of low pressure plasmas for the chemical vapor deposition (CVD) of amorphous semiconductor and insulator films
JPS57159016A (en) Manufacture of amorphous silicon film
EP0298126B1 (en) Optical cvd process
JPS57136931A (en) Photochemical reaction device
JPS57202726A (en) Manufacture of semiconductor device
JPS61230326A (ja) 気相成長装置
JPH01189123A (ja) 高分子樹脂被膜の除去方法
JPS6345377A (ja) 成膜装置
JPS6027121A (ja) 光cvd装置
JPS5685877A (en) Treatment of amorphous semiconductor film
JPS61170037A (ja) 気相成長装置
JPS59131515A (ja) アモルフアスシリコン膜の形成方法
JPS62288194A (ja) エピタキシヤル成長方法
JPS5776187A (en) Treatment by etching
JPS644024A (en) Removal of resist
JPS56109895A (en) Gaseous phase growing method for semiconductor