JPS5735860A - Preparation of photomask - Google Patents

Preparation of photomask

Info

Publication number
JPS5735860A
JPS5735860A JP11123480A JP11123480A JPS5735860A JP S5735860 A JPS5735860 A JP S5735860A JP 11123480 A JP11123480 A JP 11123480A JP 11123480 A JP11123480 A JP 11123480A JP S5735860 A JPS5735860 A JP S5735860A
Authority
JP
Japan
Prior art keywords
film
chromium
mask
deposited
thin film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11123480A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6237778B2 (enrdf_load_stackoverflow
Inventor
Shinya Kato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP11123480A priority Critical patent/JPS5735860A/ja
Publication of JPS5735860A publication Critical patent/JPS5735860A/ja
Publication of JPS6237778B2 publication Critical patent/JPS6237778B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP11123480A 1980-08-13 1980-08-13 Preparation of photomask Granted JPS5735860A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11123480A JPS5735860A (en) 1980-08-13 1980-08-13 Preparation of photomask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11123480A JPS5735860A (en) 1980-08-13 1980-08-13 Preparation of photomask

Publications (2)

Publication Number Publication Date
JPS5735860A true JPS5735860A (en) 1982-02-26
JPS6237778B2 JPS6237778B2 (enrdf_load_stackoverflow) 1987-08-14

Family

ID=14555958

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11123480A Granted JPS5735860A (en) 1980-08-13 1980-08-13 Preparation of photomask

Country Status (1)

Country Link
JP (1) JPS5735860A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5892102A (en) * 1996-02-09 1999-04-06 Mitsubishi Rayon Co., Ltd. Catalyst used in production of carboxylic acid esters and process for producing these esters
CN110676156A (zh) * 2019-10-21 2020-01-10 昆山百利合电子材料有限公司 一种光刻半导体加工工艺

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5892102A (en) * 1996-02-09 1999-04-06 Mitsubishi Rayon Co., Ltd. Catalyst used in production of carboxylic acid esters and process for producing these esters
CN110676156A (zh) * 2019-10-21 2020-01-10 昆山百利合电子材料有限公司 一种光刻半导体加工工艺

Also Published As

Publication number Publication date
JPS6237778B2 (enrdf_load_stackoverflow) 1987-08-14

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