JPS5727096A - Semiconductor laser device - Google Patents
Semiconductor laser deviceInfo
- Publication number
- JPS5727096A JPS5727096A JP10227480A JP10227480A JPS5727096A JP S5727096 A JPS5727096 A JP S5727096A JP 10227480 A JP10227480 A JP 10227480A JP 10227480 A JP10227480 A JP 10227480A JP S5727096 A JPS5727096 A JP S5727096A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- type
- light
- layered
- semiconductor laser
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/227—Buried mesa structure ; Striped active layer
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/227—Buried mesa structure ; Striped active layer
- H01S5/2275—Buried mesa structure ; Striped active layer mesa created by etching
Landscapes
- Physics & Mathematics (AREA)
- Geometry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Semiconductor Lasers (AREA)
Abstract
PURPOSE:To obtain high power oscillating light by providing a structure wherein an active layer is enclosed by a crystal layer which is transparent to a laser oscillated light, with respect to the progressing direction of the light from a resonator and at a cross section in the direction which crosses said progressing direction at a right angle. CONSTITUTION:On an N type GaAs substrate 11, are layered are a tape shaped N type Ga0.7Al0.3As layer 12, and N type Ga0.9Al0.1As layer 13, a P type Ga0.9 Al0.1 As layer 14, a P type Ga0.7Al0.3As layer 15. A P type GaAs layer 16 which becomes an active layer is embeded between the N type Ga0.9Al0.1As layer 13 which is core layer of a light waveguide and the P type Ga0.9Al0.1As layer 14. On both sides of the tape shaped layered film, are provided N type Ga0.7Al0.3As layer 17a and 17b. Said layers 17a and 17b, and the P type Ga0.7Al0.3As layer 15 and the N type Ga0.7Al0.3As layer 12, both of which are located at the upper and lower part of the core layer, constitute a clad layer for the light waveguide. A P type GaAs layer is layered on the P type Ga0.7Al0.3As layer 15, and a zinc diffused layer 19 is formed.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10227480A JPS5727096A (en) | 1980-07-25 | 1980-07-25 | Semiconductor laser device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10227480A JPS5727096A (en) | 1980-07-25 | 1980-07-25 | Semiconductor laser device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5727096A true JPS5727096A (en) | 1982-02-13 |
Family
ID=14323016
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10227480A Pending JPS5727096A (en) | 1980-07-25 | 1980-07-25 | Semiconductor laser device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5727096A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62221177A (en) * | 1986-03-24 | 1987-09-29 | Fujikura Ltd | Distributed reflection semiconductor laser |
-
1980
- 1980-07-25 JP JP10227480A patent/JPS5727096A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62221177A (en) * | 1986-03-24 | 1987-09-29 | Fujikura Ltd | Distributed reflection semiconductor laser |
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