JPS5724540A - Rinsing of through hole in semiconductor device - Google Patents

Rinsing of through hole in semiconductor device

Info

Publication number
JPS5724540A
JPS5724540A JP9818580A JP9818580A JPS5724540A JP S5724540 A JPS5724540 A JP S5724540A JP 9818580 A JP9818580 A JP 9818580A JP 9818580 A JP9818580 A JP 9818580A JP S5724540 A JPS5724540 A JP S5724540A
Authority
JP
Japan
Prior art keywords
insulating film
hole
rinsing
layers
ammonium
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9818580A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6255694B2 (enrdf_load_stackoverflow
Inventor
Yoshiharu Ozaki
Kazuo Hirata
Hitoshi Toda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP9818580A priority Critical patent/JPS5724540A/ja
Publication of JPS5724540A publication Critical patent/JPS5724540A/ja
Publication of JPS6255694B2 publication Critical patent/JPS6255694B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Weting (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Drying Of Semiconductors (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
JP9818580A 1980-07-19 1980-07-19 Rinsing of through hole in semiconductor device Granted JPS5724540A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9818580A JPS5724540A (en) 1980-07-19 1980-07-19 Rinsing of through hole in semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9818580A JPS5724540A (en) 1980-07-19 1980-07-19 Rinsing of through hole in semiconductor device

Publications (2)

Publication Number Publication Date
JPS5724540A true JPS5724540A (en) 1982-02-09
JPS6255694B2 JPS6255694B2 (enrdf_load_stackoverflow) 1987-11-20

Family

ID=14212954

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9818580A Granted JPS5724540A (en) 1980-07-19 1980-07-19 Rinsing of through hole in semiconductor device

Country Status (1)

Country Link
JP (1) JPS5724540A (enrdf_load_stackoverflow)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5768033A (en) * 1980-10-16 1982-04-26 Toshiba Corp Manufacture of semiconductor device
JPS61194833A (ja) * 1985-02-25 1986-08-29 Fujitsu Ltd シリコン基板のエツチング処理方法
JPS62252134A (ja) * 1986-04-24 1987-11-02 Matsushita Electric Ind Co Ltd 化合物半導体装置の製造方法
JPS63190380A (ja) * 1987-02-02 1988-08-05 Matsushita Electronics Corp 半導体装置の製造方法
US4826784A (en) * 1987-11-13 1989-05-02 Kopin Corporation Selective OMCVD growth of compound semiconductor materials on silicon substrates
JPH0355833A (ja) * 1989-07-24 1991-03-11 Sharp Corp 半導体装置の製造方法
JPH03100554A (ja) * 1989-09-13 1991-04-25 Fuji Photo Film Co Ltd 現像用ブラシ
WO2000034996A1 (fr) * 1998-12-09 2000-06-15 Kishimoto Sangyo Co., Ltd. Agent de decapage pour enlever les residus de reserve

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5768033A (en) * 1980-10-16 1982-04-26 Toshiba Corp Manufacture of semiconductor device
JPS61194833A (ja) * 1985-02-25 1986-08-29 Fujitsu Ltd シリコン基板のエツチング処理方法
JPS62252134A (ja) * 1986-04-24 1987-11-02 Matsushita Electric Ind Co Ltd 化合物半導体装置の製造方法
JPS63190380A (ja) * 1987-02-02 1988-08-05 Matsushita Electronics Corp 半導体装置の製造方法
US4826784A (en) * 1987-11-13 1989-05-02 Kopin Corporation Selective OMCVD growth of compound semiconductor materials on silicon substrates
JPH0355833A (ja) * 1989-07-24 1991-03-11 Sharp Corp 半導体装置の製造方法
JPH03100554A (ja) * 1989-09-13 1991-04-25 Fuji Photo Film Co Ltd 現像用ブラシ
WO2000034996A1 (fr) * 1998-12-09 2000-06-15 Kishimoto Sangyo Co., Ltd. Agent de decapage pour enlever les residus de reserve
US6534459B1 (en) 1998-12-09 2003-03-18 Kishimoto Sangyo Co., Ltd. Resist residue remover

Also Published As

Publication number Publication date
JPS6255694B2 (enrdf_load_stackoverflow) 1987-11-20

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