JPS57207337A - Pattern machining method - Google Patents

Pattern machining method

Info

Publication number
JPS57207337A
JPS57207337A JP9245281A JP9245281A JPS57207337A JP S57207337 A JPS57207337 A JP S57207337A JP 9245281 A JP9245281 A JP 9245281A JP 9245281 A JP9245281 A JP 9245281A JP S57207337 A JPS57207337 A JP S57207337A
Authority
JP
Japan
Prior art keywords
film
separating
constitution
window
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9245281A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6310824B2 (enrdf_load_stackoverflow
Inventor
Akira Morishige
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP9245281A priority Critical patent/JPS57207337A/ja
Publication of JPS57207337A publication Critical patent/JPS57207337A/ja
Publication of JPS6310824B2 publication Critical patent/JPS6310824B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/72—Repair or correction of mask defects

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP9245281A 1981-06-16 1981-06-16 Pattern machining method Granted JPS57207337A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9245281A JPS57207337A (en) 1981-06-16 1981-06-16 Pattern machining method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9245281A JPS57207337A (en) 1981-06-16 1981-06-16 Pattern machining method

Publications (2)

Publication Number Publication Date
JPS57207337A true JPS57207337A (en) 1982-12-20
JPS6310824B2 JPS6310824B2 (enrdf_load_stackoverflow) 1988-03-09

Family

ID=14054786

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9245281A Granted JPS57207337A (en) 1981-06-16 1981-06-16 Pattern machining method

Country Status (1)

Country Link
JP (1) JPS57207337A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH039354A (ja) * 1989-06-06 1991-01-17 Dainippon Printing Co Ltd エマルジョンマスク等の欠陥修正方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH039354A (ja) * 1989-06-06 1991-01-17 Dainippon Printing Co Ltd エマルジョンマスク等の欠陥修正方法

Also Published As

Publication number Publication date
JPS6310824B2 (enrdf_load_stackoverflow) 1988-03-09

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