JPS55158636A - Photo-mask for semiconductor device - Google Patents

Photo-mask for semiconductor device

Info

Publication number
JPS55158636A
JPS55158636A JP6657879A JP6657879A JPS55158636A JP S55158636 A JPS55158636 A JP S55158636A JP 6657879 A JP6657879 A JP 6657879A JP 6657879 A JP6657879 A JP 6657879A JP S55158636 A JPS55158636 A JP S55158636A
Authority
JP
Japan
Prior art keywords
side surfaces
photo
mask
glass
grooves
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6657879A
Other languages
Japanese (ja)
Inventor
Tadanao Igarashi
Toshio Oguchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP6657879A priority Critical patent/JPS55158636A/en
Publication of JPS55158636A publication Critical patent/JPS55158636A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/60—Substrates
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)

Abstract

PURPOSE:To obtain a photo-mask which is easy to be carried and its two side surfaces are not stained by a method wherein grooves are preveiously formed to the side surfaces of a glass substrate used when a photo-resist film coated on a semiconductor substrate is patterned. CONSTITUTION:A photo-mask consisting of glass for IC normally forms a square, whose one side is several inches, and its thickness is 0.1 inch or less. When preparing the mask, melted glass is poured into metal molds, whose side-walls are provided with projections, and hardened or a glass substrate is worked by a grinder, and grooves are previously formed to facing side surfaces or all of four side surfaces. Thus, handling by means of a suitable jig becomes easy, and pollution on the two side surfaces is remarkably decreased.
JP6657879A 1979-05-29 1979-05-29 Photo-mask for semiconductor device Pending JPS55158636A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6657879A JPS55158636A (en) 1979-05-29 1979-05-29 Photo-mask for semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6657879A JPS55158636A (en) 1979-05-29 1979-05-29 Photo-mask for semiconductor device

Publications (1)

Publication Number Publication Date
JPS55158636A true JPS55158636A (en) 1980-12-10

Family

ID=13319969

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6657879A Pending JPS55158636A (en) 1979-05-29 1979-05-29 Photo-mask for semiconductor device

Country Status (1)

Country Link
JP (1) JPS55158636A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59192150U (en) * 1983-06-07 1984-12-20 富士通株式会社 photomask substrate
JP2010107613A (en) * 2008-10-29 2010-05-13 Tosoh Corp Substrate for photomask and method for manufacturing the substrate

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59192150U (en) * 1983-06-07 1984-12-20 富士通株式会社 photomask substrate
JP2010107613A (en) * 2008-10-29 2010-05-13 Tosoh Corp Substrate for photomask and method for manufacturing the substrate

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