JPS6310824B2 - - Google Patents

Info

Publication number
JPS6310824B2
JPS6310824B2 JP9245281A JP9245281A JPS6310824B2 JP S6310824 B2 JPS6310824 B2 JP S6310824B2 JP 9245281 A JP9245281 A JP 9245281A JP 9245281 A JP9245281 A JP 9245281A JP S6310824 B2 JPS6310824 B2 JP S6310824B2
Authority
JP
Japan
Prior art keywords
mask
pattern
film
chromium
protective agent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP9245281A
Other languages
English (en)
Japanese (ja)
Other versions
JPS57207337A (en
Inventor
Akira Morishige
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP9245281A priority Critical patent/JPS57207337A/ja
Publication of JPS57207337A publication Critical patent/JPS57207337A/ja
Publication of JPS6310824B2 publication Critical patent/JPS6310824B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/72—Repair or correction of mask defects

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP9245281A 1981-06-16 1981-06-16 Pattern machining method Granted JPS57207337A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9245281A JPS57207337A (en) 1981-06-16 1981-06-16 Pattern machining method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9245281A JPS57207337A (en) 1981-06-16 1981-06-16 Pattern machining method

Publications (2)

Publication Number Publication Date
JPS57207337A JPS57207337A (en) 1982-12-20
JPS6310824B2 true JPS6310824B2 (enrdf_load_stackoverflow) 1988-03-09

Family

ID=14054786

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9245281A Granted JPS57207337A (en) 1981-06-16 1981-06-16 Pattern machining method

Country Status (1)

Country Link
JP (1) JPS57207337A (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2877838B2 (ja) * 1989-06-06 1999-04-05 大日本印刷株式会社 エマルジョンマスク等の欠陥修正方法

Also Published As

Publication number Publication date
JPS57207337A (en) 1982-12-20

Similar Documents

Publication Publication Date Title
US4218532A (en) Photolithographic technique for depositing thin films
US4379833A (en) Self-aligned photoresist process
US3508982A (en) Method of making an ultra-violet selective template
JPS61240452A (ja) ガラス成形型製作方法
JPS5922050A (ja) ホトマスク
JPS6310824B2 (enrdf_load_stackoverflow)
JPH07295204A (ja) 位相シフトマスクの修正方法
JPS59128540A (ja) フオトマスク
JPS5829619B2 (ja) シヤシンシヨツコクヨウホトマスク
JPS63218959A (ja) ホトマスクパタ−ンの修正方法
JPS6140102B2 (enrdf_load_stackoverflow)
JPS5919322A (ja) クロムマスクの修正方法
JPS61198722A (ja) Ｘ線露光マスク及びその製造方法
JPS6153849B2 (enrdf_load_stackoverflow)
JPS6237779B2 (enrdf_load_stackoverflow)
JPH06112119A (ja) レジストパターン形成方法
JPH0440456A (ja) フォトマスクの製造方法
JPS6032203A (ja) 透明薄膜のパタ−ニング方法
JPH0363734B2 (enrdf_load_stackoverflow)
JPS62217241A (ja) 薄膜レジスト形成方法
JPH0338644A (ja) フォトマスク及びその製造方法
JPS6075836A (ja) フォトマスクのパタ−ン修正方法
JPS58184146A (ja) マスク基板の製造方法
JPH0464170B2 (enrdf_load_stackoverflow)
JPS631739B2 (enrdf_load_stackoverflow)