JPH0464170B2 - - Google Patents

Info

Publication number
JPH0464170B2
JPH0464170B2 JP58205236A JP20523683A JPH0464170B2 JP H0464170 B2 JPH0464170 B2 JP H0464170B2 JP 58205236 A JP58205236 A JP 58205236A JP 20523683 A JP20523683 A JP 20523683A JP H0464170 B2 JPH0464170 B2 JP H0464170B2
Authority
JP
Japan
Prior art keywords
pattern
ray
ultraviolet light
resist
photosensitive resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58205236A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6097355A (ja
Inventor
Yasuo Iida
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Co Ltd filed Critical Nippon Electric Co Ltd
Priority to JP58205236A priority Critical patent/JPS6097355A/ja
Publication of JPS6097355A publication Critical patent/JPS6097355A/ja
Publication of JPH0464170B2 publication Critical patent/JPH0464170B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/72—Repair or correction of mask defects

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP58205236A 1983-11-01 1983-11-01 Ｘ線露光用マスクの製造方法 Granted JPS6097355A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58205236A JPS6097355A (ja) 1983-11-01 1983-11-01 Ｘ線露光用マスクの製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58205236A JPS6097355A (ja) 1983-11-01 1983-11-01 Ｘ線露光用マスクの製造方法

Publications (2)

Publication Number Publication Date
JPS6097355A JPS6097355A (ja) 1985-05-31
JPH0464170B2 true JPH0464170B2 (enrdf_load_stackoverflow) 1992-10-14

Family

ID=16503657

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58205236A Granted JPS6097355A (ja) 1983-11-01 1983-11-01 Ｘ線露光用マスクの製造方法

Country Status (1)

Country Link
JP (1) JPS6097355A (enrdf_load_stackoverflow)

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0057268A3 (en) * 1981-02-02 1982-11-10 International Business Machines Corporation Method of fabricating x-ray lithographic masks

Also Published As

Publication number Publication date
JPS6097355A (ja) 1985-05-31

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