JPS57198668A - Light receiving element - Google Patents
Light receiving elementInfo
- Publication number
- JPS57198668A JPS57198668A JP56084000A JP8400081A JPS57198668A JP S57198668 A JPS57198668 A JP S57198668A JP 56084000 A JP56084000 A JP 56084000A JP 8400081 A JP8400081 A JP 8400081A JP S57198668 A JPS57198668 A JP S57198668A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- light receiving
- semiconductor layer
- element semiconductor
- iii
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 abstract 6
- 230000015556 catabolic process Effects 0.000 abstract 1
- 239000012535 impurity Substances 0.000 abstract 1
- 239000007791 liquid phase Substances 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/08—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors
- H01L31/10—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors characterised by potential barriers, e.g. phototransistors
- H01L31/101—Devices sensitive to infrared, visible or ultraviolet radiation
- H01L31/102—Devices sensitive to infrared, visible or ultraviolet radiation characterised by only one potential barrier
- H01L31/107—Devices sensitive to infrared, visible or ultraviolet radiation characterised by only one potential barrier the potential barrier working in avalanche mode, e.g. avalanche photodiodes
- H01L31/1075—Devices sensitive to infrared, visible or ultraviolet radiation characterised by only one potential barrier the potential barrier working in avalanche mode, e.g. avalanche photodiodes in which the active layers, e.g. absorption or multiplication layers, form an heterostructure, e.g. SAM structure
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Radiation Pyrometers (AREA)
- Light Receiving Elements (AREA)
Abstract
PURPOSE:To display ring effect efficiently and to decrease a noise level, in the light receiving element wherein a light receiving part and a guard ring are provided on the surface of a III-V group two element semiconductor layer, by providing a III-V multiple element semiconductor layer which has narrower forbidden band width than that of said two element semiconductor layer and higher carrier concentration in said two element semiconductor layer. CONSTITUTION:On an N<+> type InP substrate 4, an N type InP buffer layer 3 and an N type InGaAsP light absorbing layer 2 which is the III-V group multiple element semiconductor layer are layered and epitaxially grown in a liquid phase. The device is once taken out of a growing furnace. The layer 2 with a diameter of about 100mum which is to become the light receiving part is left, and the other part is etched away. Then the device is put in the growing furnace again. On the entire surface of the layer 2 including the remaining layer 2, the III-V group two element semiconductor layer 1 which is to become a window layer is grown. P type impurities are doped therein, and the P type light receiving part 5 and the guard ring part 6 which encircles the part 5 in a ring shape are formed. When a high reverse voltage is applied in this constitution, breakdown preferentially occurs at the junction between the light receiving part 5 and the window layer 1.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56084000A JPS57198668A (en) | 1981-06-01 | 1981-06-01 | Light receiving element |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56084000A JPS57198668A (en) | 1981-06-01 | 1981-06-01 | Light receiving element |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57198668A true JPS57198668A (en) | 1982-12-06 |
JPH0231509B2 JPH0231509B2 (en) | 1990-07-13 |
Family
ID=13818254
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP56084000A Granted JPS57198668A (en) | 1981-06-01 | 1981-06-01 | Light receiving element |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57198668A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6285832A (en) * | 1985-10-11 | 1987-04-20 | Mitsubishi Cable Ind Ltd | Optical type thermometer |
US4835575A (en) * | 1987-02-06 | 1989-05-30 | Siemens Aktiengesellschaft | Monolithically integrated waveguide-photodiode combination |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS51140587A (en) * | 1975-05-16 | 1976-12-03 | Thomson Csf | Avalanche photodiode |
JPS5513990A (en) * | 1978-07-18 | 1980-01-31 | Nec Corp | Semiconductor device |
JPS5572084A (en) * | 1978-11-27 | 1980-05-30 | Nippon Telegr & Teleph Corp <Ntt> | Semiconductor photo-detector |
-
1981
- 1981-06-01 JP JP56084000A patent/JPS57198668A/en active Granted
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS51140587A (en) * | 1975-05-16 | 1976-12-03 | Thomson Csf | Avalanche photodiode |
JPS5513990A (en) * | 1978-07-18 | 1980-01-31 | Nec Corp | Semiconductor device |
JPS5572084A (en) * | 1978-11-27 | 1980-05-30 | Nippon Telegr & Teleph Corp <Ntt> | Semiconductor photo-detector |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6285832A (en) * | 1985-10-11 | 1987-04-20 | Mitsubishi Cable Ind Ltd | Optical type thermometer |
US4835575A (en) * | 1987-02-06 | 1989-05-30 | Siemens Aktiengesellschaft | Monolithically integrated waveguide-photodiode combination |
Also Published As
Publication number | Publication date |
---|---|
JPH0231509B2 (en) | 1990-07-13 |
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