JPS57188866A - Manufacture of semiconductor device - Google Patents
Manufacture of semiconductor deviceInfo
- Publication number
- JPS57188866A JPS57188866A JP56073546A JP7354681A JPS57188866A JP S57188866 A JPS57188866 A JP S57188866A JP 56073546 A JP56073546 A JP 56073546A JP 7354681 A JP7354681 A JP 7354681A JP S57188866 A JPS57188866 A JP S57188866A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- layer
- capacity section
- accumulated capacity
- becoming
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 title abstract 2
- 238000004519 manufacturing process Methods 0.000 title 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 4
- 239000000758 substrate Substances 0.000 abstract 3
- 229910052681 coesite Inorganic materials 0.000 abstract 2
- 229910052906 cristobalite Inorganic materials 0.000 abstract 2
- 238000002955 isolation Methods 0.000 abstract 2
- 239000000377 silicon dioxide Substances 0.000 abstract 2
- 235000012239 silicon dioxide Nutrition 0.000 abstract 2
- 229910052682 stishovite Inorganic materials 0.000 abstract 2
- 229910052905 tridymite Inorganic materials 0.000 abstract 2
- -1 Boron ions Chemical class 0.000 abstract 1
- 238000000137 annealing Methods 0.000 abstract 1
- 229910052785 arsenic Inorganic materials 0.000 abstract 1
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 abstract 1
- 229910052796 boron Inorganic materials 0.000 abstract 1
- 230000008021 deposition Effects 0.000 abstract 1
- 239000012535 impurity Substances 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B12/00—Dynamic random access memory [DRAM] devices
- H10B12/01—Manufacture or treatment
- H10B12/02—Manufacture or treatment for one transistor one-capacitor [1T-1C] memory cells
- H10B12/03—Making the capacitor or connections thereto
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Element Separation (AREA)
- Semiconductor Integrated Circuits (AREA)
- Semiconductor Memories (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56073546A JPS57188866A (en) | 1981-05-18 | 1981-05-18 | Manufacture of semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56073546A JPS57188866A (en) | 1981-05-18 | 1981-05-18 | Manufacture of semiconductor device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57188866A true JPS57188866A (en) | 1982-11-19 |
JPH0328071B2 JPH0328071B2 (enrdf_load_stackoverflow) | 1991-04-17 |
Family
ID=13521334
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP56073546A Granted JPS57188866A (en) | 1981-05-18 | 1981-05-18 | Manufacture of semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57188866A (enrdf_load_stackoverflow) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6022361A (ja) * | 1983-07-19 | 1985-02-04 | Nec Corp | Mis型半導体記憶装置の製造方法 |
JPS60216577A (ja) * | 1984-01-26 | 1985-10-30 | ソーン、イーエムアイ、ノース、アメリカ、インコーポレーテッド | 半導体メモリ構造体及びその製造方法 |
US4961165A (en) * | 1987-11-17 | 1990-10-02 | Fujitsu Limited | Semiconductor memory device having a charge barrier layer for preventing soft error |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5333053A (en) * | 1976-09-09 | 1978-03-28 | Toshiba Corp | Production of semiconductor device |
JPS55141750A (en) * | 1979-04-23 | 1980-11-05 | Nec Corp | Insulated gate type semiconductor device |
-
1981
- 1981-05-18 JP JP56073546A patent/JPS57188866A/ja active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5333053A (en) * | 1976-09-09 | 1978-03-28 | Toshiba Corp | Production of semiconductor device |
JPS55141750A (en) * | 1979-04-23 | 1980-11-05 | Nec Corp | Insulated gate type semiconductor device |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6022361A (ja) * | 1983-07-19 | 1985-02-04 | Nec Corp | Mis型半導体記憶装置の製造方法 |
JPS60216577A (ja) * | 1984-01-26 | 1985-10-30 | ソーン、イーエムアイ、ノース、アメリカ、インコーポレーテッド | 半導体メモリ構造体及びその製造方法 |
US4961165A (en) * | 1987-11-17 | 1990-10-02 | Fujitsu Limited | Semiconductor memory device having a charge barrier layer for preventing soft error |
Also Published As
Publication number | Publication date |
---|---|
JPH0328071B2 (enrdf_load_stackoverflow) | 1991-04-17 |
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