JPS57166397A - Converting method of silicon wafer into single crystal - Google Patents
Converting method of silicon wafer into single crystalInfo
- Publication number
- JPS57166397A JPS57166397A JP4859481A JP4859481A JPS57166397A JP S57166397 A JPS57166397 A JP S57166397A JP 4859481 A JP4859481 A JP 4859481A JP 4859481 A JP4859481 A JP 4859481A JP S57166397 A JPS57166397 A JP S57166397A
- Authority
- JP
- Japan
- Prior art keywords
- single crystal
- silicon wafer
- oxide film
- polycrystalline
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
- Recrystallisation Techniques (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4859481A JPS57166397A (en) | 1981-03-31 | 1981-03-31 | Converting method of silicon wafer into single crystal |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4859481A JPS57166397A (en) | 1981-03-31 | 1981-03-31 | Converting method of silicon wafer into single crystal |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS57166397A true JPS57166397A (en) | 1982-10-13 |
| JPH024559B2 JPH024559B2 (enrdf_load_html_response) | 1990-01-29 |
Family
ID=12807727
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4859481A Granted JPS57166397A (en) | 1981-03-31 | 1981-03-31 | Converting method of silicon wafer into single crystal |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS57166397A (enrdf_load_html_response) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6090898A (ja) * | 1983-10-21 | 1985-05-22 | Agency Of Ind Science & Technol | 単結晶シリコン膜形成法 |
| JPS62130509A (ja) * | 1985-12-02 | 1987-06-12 | Agency Of Ind Science & Technol | 半導体基体の製造方法 |
| JPH0282518A (ja) * | 1988-09-20 | 1990-03-23 | Agency Of Ind Science & Technol | 半導体単結晶層の製造方法 |
-
1981
- 1981-03-31 JP JP4859481A patent/JPS57166397A/ja active Granted
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6090898A (ja) * | 1983-10-21 | 1985-05-22 | Agency Of Ind Science & Technol | 単結晶シリコン膜形成法 |
| JPS62130509A (ja) * | 1985-12-02 | 1987-06-12 | Agency Of Ind Science & Technol | 半導体基体の製造方法 |
| JPH0282518A (ja) * | 1988-09-20 | 1990-03-23 | Agency Of Ind Science & Technol | 半導体単結晶層の製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH024559B2 (enrdf_load_html_response) | 1990-01-29 |
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