JPS57159021A - Forming method of pattern - Google Patents
Forming method of patternInfo
- Publication number
- JPS57159021A JPS57159021A JP56043211A JP4321181A JPS57159021A JP S57159021 A JPS57159021 A JP S57159021A JP 56043211 A JP56043211 A JP 56043211A JP 4321181 A JP4321181 A JP 4321181A JP S57159021 A JPS57159021 A JP S57159021A
- Authority
- JP
- Japan
- Prior art keywords
- pattern
- metal
- forming
- photoresist
- electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000002184 metal Substances 0.000 abstract 5
- 229920002120 photoresistant polymer Polymers 0.000 abstract 4
- 238000005530 etching Methods 0.000 abstract 2
- 230000015572 biosynthetic process Effects 0.000 abstract 1
- 238000006073 displacement reaction Methods 0.000 abstract 1
- 238000001259 photo etching Methods 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
PURPOSE:To enable the formation of a pattern in high reliability by repeating several times photoetching steps for forming a gate electrode, thereby reducing the side etching amount of gate electrode metal and compensating for the displacement of aligning. CONSTITUTION:An insulating film 3 excluding a diffused layer 3 and an electrode forming pattern is formed on a substrate 1, an electrode forming metal 4 is produced on the film 3 and at the part of the pattern for forming the electrode of the layer 3, and a photoresist 5 is coated on the metal 4, thereby forming a pattern. Then, it is etched to 1/2 to the thickness of the metal 4, the photoresist 5 is then removed, the photoresist 5 is again coated on the overall surface of the metal 4, and is etched. In this case, since the side etched part 6 formed by the first etching is covered with the second photoresist 5, the processing accuracey can be improved.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56043211A JPS57159021A (en) | 1981-03-26 | 1981-03-26 | Forming method of pattern |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56043211A JPS57159021A (en) | 1981-03-26 | 1981-03-26 | Forming method of pattern |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS57159021A true JPS57159021A (en) | 1982-10-01 |
Family
ID=12657578
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP56043211A Pending JPS57159021A (en) | 1981-03-26 | 1981-03-26 | Forming method of pattern |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS57159021A (en) |
-
1981
- 1981-03-26 JP JP56043211A patent/JPS57159021A/en active Pending
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