JPS57157247A - Optical exposure mask - Google Patents

Optical exposure mask

Info

Publication number
JPS57157247A
JPS57157247A JP4217681A JP4217681A JPS57157247A JP S57157247 A JPS57157247 A JP S57157247A JP 4217681 A JP4217681 A JP 4217681A JP 4217681 A JP4217681 A JP 4217681A JP S57157247 A JPS57157247 A JP S57157247A
Authority
JP
Japan
Prior art keywords
layer
silicon
silicide
mask
electron beams
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4217681A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6340305B2 (enrdf_load_stackoverflow
Inventor
Nobuhiro Endo
Katsumi Mori
Yasuo Iida
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP4217681A priority Critical patent/JPS57157247A/ja
Publication of JPS57157247A publication Critical patent/JPS57157247A/ja
Publication of JPS6340305B2 publication Critical patent/JPS6340305B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/76—Patterning of masks by imaging
    • G03F1/78—Patterning of masks by imaging by charged particle beam [CPB], e.g. electron beam patterning of masks
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP4217681A 1981-03-23 1981-03-23 Optical exposure mask Granted JPS57157247A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4217681A JPS57157247A (en) 1981-03-23 1981-03-23 Optical exposure mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4217681A JPS57157247A (en) 1981-03-23 1981-03-23 Optical exposure mask

Publications (2)

Publication Number Publication Date
JPS57157247A true JPS57157247A (en) 1982-09-28
JPS6340305B2 JPS6340305B2 (enrdf_load_stackoverflow) 1988-08-10

Family

ID=12628667

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4217681A Granted JPS57157247A (en) 1981-03-23 1981-03-23 Optical exposure mask

Country Status (1)

Country Link
JP (1) JPS57157247A (enrdf_load_stackoverflow)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60202441A (ja) * 1984-03-27 1985-10-12 Mitsubishi Electric Corp 半導体装置用パタ−ン形成マスク
JPS61173249A (ja) * 1985-01-28 1986-08-04 Mitsubishi Electric Corp フオトマスク
US4717625A (en) * 1985-08-30 1988-01-05 Mitsubishi Denki Kabushiki Kaisha Photomask material
US4783371A (en) * 1985-08-30 1988-11-08 Mitsubishi Denki Kabushiki Kaisha Photomask material
US4876164A (en) * 1985-01-28 1989-10-24 Mitsubishi Denki Kabushiki Kaisha Process for manufacturing a photomask

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60202441A (ja) * 1984-03-27 1985-10-12 Mitsubishi Electric Corp 半導体装置用パタ−ン形成マスク
JPS61173249A (ja) * 1985-01-28 1986-08-04 Mitsubishi Electric Corp フオトマスク
US4876164A (en) * 1985-01-28 1989-10-24 Mitsubishi Denki Kabushiki Kaisha Process for manufacturing a photomask
US4717625A (en) * 1985-08-30 1988-01-05 Mitsubishi Denki Kabushiki Kaisha Photomask material
US4783371A (en) * 1985-08-30 1988-11-08 Mitsubishi Denki Kabushiki Kaisha Photomask material

Also Published As

Publication number Publication date
JPS6340305B2 (enrdf_load_stackoverflow) 1988-08-10

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