JPS5688135A - Developer - Google Patents

Developer

Info

Publication number
JPS5688135A
JPS5688135A JP16557579A JP16557579A JPS5688135A JP S5688135 A JPS5688135 A JP S5688135A JP 16557579 A JP16557579 A JP 16557579A JP 16557579 A JP16557579 A JP 16557579A JP S5688135 A JPS5688135 A JP S5688135A
Authority
JP
Japan
Prior art keywords
isobutyl acetate
acetate
film
developed
soln
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP16557579A
Other languages
Japanese (ja)
Other versions
JPS6360376B2 (en
Inventor
Hiroshi Shiraishi
Saburo Nonogaki
Kiyotake Naraoka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP16557579A priority Critical patent/JPS5688135A/en
Publication of JPS5688135A publication Critical patent/JPS5688135A/en
Publication of JPS6360376B2 publication Critical patent/JPS6360376B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/325—Non-aqueous compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

PURPOSE:To enable a positive type radiation sensitive material to be rapidly developed with high accuracy by using isobutyl acetate or a solution of isobutyl acetate in a bed solvent for the material to be developed as a developer. CONSTITUTION:A positive type radiation sensitive material such as methyl methacrylate-acrylonitrile copolymer for a mask used in the manufacture of a semiconductor element, etc. is developed with isobutyl acetate or a mixed soln. of isobutyl acetate and <50% isoamyl acetate, n-amyl acetate or the like which is a bad solvent for the above-mentioned material. For example, a Cr film is formed on a glass plate by vapor deposition, and an MMA-AN (about 11% AN) copolymer soln. is applied to the Cr film and dried. A predetermined pattern is then drawn on the resulting film with electron beams, and a 1:1 mixed solvent of isobutyl acetate and isoamyl acetate is sprayed for about 8min and dried to obtain an image with 0.5mu line width. When development with isobutyl acetate alone causes such rapid dissolution that a film reduction of the unirradiated part occurs, the mixed soln. is favorably used.
JP16557579A 1979-12-21 1979-12-21 Developer Granted JPS5688135A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16557579A JPS5688135A (en) 1979-12-21 1979-12-21 Developer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16557579A JPS5688135A (en) 1979-12-21 1979-12-21 Developer

Publications (2)

Publication Number Publication Date
JPS5688135A true JPS5688135A (en) 1981-07-17
JPS6360376B2 JPS6360376B2 (en) 1988-11-24

Family

ID=15814954

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16557579A Granted JPS5688135A (en) 1979-12-21 1979-12-21 Developer

Country Status (1)

Country Link
JP (1) JPS5688135A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6139041A (en) * 1984-07-31 1986-02-25 Tokyo Ohka Kogyo Co Ltd Developing solution of positive type resist
JPS62175739A (en) * 1986-01-30 1987-08-01 Toshiba Corp Pattern forming method
JPH0328851A (en) * 1988-05-24 1991-02-07 Toppan Printing Co Ltd Method for forming electron beam resist pattern

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6139041A (en) * 1984-07-31 1986-02-25 Tokyo Ohka Kogyo Co Ltd Developing solution of positive type resist
JPH0451019B2 (en) * 1984-07-31 1992-08-17 Tokyo Ohka Kogyo Co Ltd
JPS62175739A (en) * 1986-01-30 1987-08-01 Toshiba Corp Pattern forming method
JPH0328851A (en) * 1988-05-24 1991-02-07 Toppan Printing Co Ltd Method for forming electron beam resist pattern

Also Published As

Publication number Publication date
JPS6360376B2 (en) 1988-11-24

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