JPS57152464A - Manufacture of photoconductive member - Google Patents

Manufacture of photoconductive member

Info

Publication number
JPS57152464A
JPS57152464A JP56037442A JP3744281A JPS57152464A JP S57152464 A JPS57152464 A JP S57152464A JP 56037442 A JP56037442 A JP 56037442A JP 3744281 A JP3744281 A JP 3744281A JP S57152464 A JPS57152464 A JP S57152464A
Authority
JP
Japan
Prior art keywords
compounds
photoconductive
photoconductive layer
mixed
halogen
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56037442A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6331552B2 (enrdf_load_stackoverflow
Inventor
Isamu Shimizu
Kyosuke Ogawa
Hidekazu Inoue
Junichiro Kanbe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP56037442A priority Critical patent/JPS57152464A/ja
Priority to US06/354,898 priority patent/US4468443A/en
Priority to DE19823209055 priority patent/DE3209055A1/de
Publication of JPS57152464A publication Critical patent/JPS57152464A/ja
Publication of JPS6331552B2 publication Critical patent/JPS6331552B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/24Deposition of silicon only

Landscapes

  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Light Receiving Elements (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Chemical Vapour Deposition (AREA)
JP56037442A 1981-03-12 1981-03-16 Manufacture of photoconductive member Granted JPS57152464A (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP56037442A JPS57152464A (en) 1981-03-16 1981-03-16 Manufacture of photoconductive member
US06/354,898 US4468443A (en) 1981-03-12 1982-03-04 Process for producing photoconductive member from gaseous silicon compounds
DE19823209055 DE3209055A1 (de) 1981-03-12 1982-03-12 Verfahren zur herstellung eines fotoleitfaehigen elements

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56037442A JPS57152464A (en) 1981-03-16 1981-03-16 Manufacture of photoconductive member

Publications (2)

Publication Number Publication Date
JPS57152464A true JPS57152464A (en) 1982-09-20
JPS6331552B2 JPS6331552B2 (enrdf_load_stackoverflow) 1988-06-24

Family

ID=12497619

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56037442A Granted JPS57152464A (en) 1981-03-12 1981-03-16 Manufacture of photoconductive member

Country Status (1)

Country Link
JP (1) JPS57152464A (enrdf_load_stackoverflow)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57174450A (en) * 1981-04-21 1982-10-27 Canon Inc Production of photoconductive member
JPS59127647A (ja) * 1983-01-11 1984-07-23 Mitsui Toatsu Chem Inc 非晶質薄膜の製法
JPS59179151A (ja) * 1983-03-30 1984-10-11 Mitsui Toatsu Chem Inc 非晶質薄膜の製法
JPS6068050A (ja) * 1983-08-19 1985-04-18 エナージー・コンバーション・デバイセス・インコーポレーテッド 化学種の検出方法

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57174450A (en) * 1981-04-21 1982-10-27 Canon Inc Production of photoconductive member
JPS59127647A (ja) * 1983-01-11 1984-07-23 Mitsui Toatsu Chem Inc 非晶質薄膜の製法
JPS59179151A (ja) * 1983-03-30 1984-10-11 Mitsui Toatsu Chem Inc 非晶質薄膜の製法
JPS6068050A (ja) * 1983-08-19 1985-04-18 エナージー・コンバーション・デバイセス・インコーポレーテッド 化学種の検出方法
JPH06339627A (ja) * 1983-08-19 1994-12-13 Energy Conversion Devices Inc 基板上に半導体材料を堆積する方法および薄膜製造法

Also Published As

Publication number Publication date
JPS6331552B2 (enrdf_load_stackoverflow) 1988-06-24

Similar Documents

Publication Publication Date Title
JPS5767020A (en) Thin silicon film and its manufacture
JPS57167631A (en) Plasma vapor-phase growing method
JPS57152464A (en) Manufacture of photoconductive member
JPS5728322A (en) Formation of semiconductor single crystal layer
JPS57152462A (en) Manufacture of photoconductive member
MY113555A (en) A method of making glass
JPS57152463A (en) Manufacture of photoconductive member
JPS5683746A (en) Electrophotographic image forming member
JPS5423386A (en) Manufacture of semiconductor device
JPS5664346A (en) Electrophotographic receptor and its preparation
ES8505623A1 (es) Un metodo de fabricar guiaondas opticas
JPS57174449A (en) Production of photoconductive member
JPS57174450A (en) Production of photoconductive member
JPS57174452A (en) Production of photoconductive member
JPS5680128A (en) Manufacture of thin film
JPS57147638A (en) Production of photoconductive member
JPS57174448A (en) Production of photoconductive member
JPS57149464A (en) Production of photoconductive member
JPS5553415A (en) Selective epitaxial growing
JPS57174454A (en) Production of photoconductive member
JPS57174451A (en) Production of photoconductive member
JPS5595318A (en) Production of amorphous film
JPS6437008A (en) Manufacture of amorphous semiconductor film
JPS53125760A (en) Manufacture for gas discharging panel
JPS6421078A (en) Fast particle beam thin film growth method