JPS57147269A - Manufacture of semiconductor device - Google Patents

Manufacture of semiconductor device

Info

Publication number
JPS57147269A
JPS57147269A JP56031698A JP3169881A JPS57147269A JP S57147269 A JPS57147269 A JP S57147269A JP 56031698 A JP56031698 A JP 56031698A JP 3169881 A JP3169881 A JP 3169881A JP S57147269 A JPS57147269 A JP S57147269A
Authority
JP
Japan
Prior art keywords
igfet
gate
channel igfet
window
active state
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56031698A
Other languages
English (en)
Other versions
JPH0253946B2 (ja
Inventor
Hidetoshi Kosaka
Toshiaki Hoshi
Hiroshi Tanaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP56031698A priority Critical patent/JPS57147269A/ja
Publication of JPS57147269A publication Critical patent/JPS57147269A/ja
Publication of JPH0253946B2 publication Critical patent/JPH0253946B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/04Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
    • H01L27/08Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind
    • H01L27/085Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only
    • H01L27/088Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only the components being field-effect transistors with insulated gate
    • H01L27/092Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only the components being field-effect transistors with insulated gate complementary MIS field-effect transistors

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Logic Circuits (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
  • Design And Manufacture Of Integrated Circuits (AREA)
JP56031698A 1981-03-05 1981-03-05 Manufacture of semiconductor device Granted JPS57147269A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56031698A JPS57147269A (en) 1981-03-05 1981-03-05 Manufacture of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56031698A JPS57147269A (en) 1981-03-05 1981-03-05 Manufacture of semiconductor device

Publications (2)

Publication Number Publication Date
JPS57147269A true JPS57147269A (en) 1982-09-11
JPH0253946B2 JPH0253946B2 (ja) 1990-11-20

Family

ID=12338286

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56031698A Granted JPS57147269A (en) 1981-03-05 1981-03-05 Manufacture of semiconductor device

Country Status (1)

Country Link
JP (1) JPS57147269A (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0194722A (ja) * 1987-10-07 1989-04-13 Sharp Corp イオン注入によるプログラム可能論理素子

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4918437A (ja) * 1972-06-09 1974-02-18
JPS56118351A (en) * 1980-02-22 1981-09-17 Fujitsu Ltd Preparation of integrated circuit

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4918437A (ja) * 1972-06-09 1974-02-18
JPS56118351A (en) * 1980-02-22 1981-09-17 Fujitsu Ltd Preparation of integrated circuit

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0194722A (ja) * 1987-10-07 1989-04-13 Sharp Corp イオン注入によるプログラム可能論理素子

Also Published As

Publication number Publication date
JPH0253946B2 (ja) 1990-11-20

Similar Documents

Publication Publication Date Title
US4472871A (en) Method of making a plurality of MOSFETs having different threshold voltages
KR960009994B1 (ko) 반도체 메모리 장치 및 그 제조방법
KR870001665A (ko) Rom 제조방법
ES385205A1 (es) Metodo de fabricacion de un dispositivo semiconductor.
SE8204247L (sv) Referensspenningsgenerator
GB1447236A (en) Methods of manufacturing integrated circuits including field effect transistors
US3867204A (en) Manufacture of semiconductor devices
JPS57147269A (en) Manufacture of semiconductor device
JPS5333074A (en) Production of complementary type insulated gate field effect semiconductor device
GB2017406A (en) Implant programmable semi- conductor read only memory
JPH0391247A (ja) Mosfet空乏デバイス
JPS57107067A (en) Manufacture of semiconductor device
JPS56118352A (en) Preparation of output circuit of integrated circuit
JPS57111060A (en) Manufacture of semiconductor device
JPS57160148A (en) Microwave integrated circuit device
KR890004453B1 (ko) 집적회로장치의 제조방법
JPS57102073A (en) Semiconductor memory and manufacture thereof
GB1432309A (en) Semiconductor structures
KR910017645A (ko) 반도체불휘발성메모리 및 그 제조방법
JPS57160171A (en) Manufacture of semiconductor device
JPS6450419A (en) Manufacture of complementary mos semiconductor device
KR940001380A (ko) 반도체메모리장치 및 그 제조방법
JPS643951A (en) Ion implantation method and device
JPS5651873A (en) Mos transistor
JPS57172758A (en) Manufacture of semiconductor device