JPS57139928A - Manufacture of semiconductor device - Google Patents

Manufacture of semiconductor device

Info

Publication number
JPS57139928A
JPS57139928A JP56025663A JP2566381A JPS57139928A JP S57139928 A JPS57139928 A JP S57139928A JP 56025663 A JP56025663 A JP 56025663A JP 2566381 A JP2566381 A JP 2566381A JP S57139928 A JPS57139928 A JP S57139928A
Authority
JP
Japan
Prior art keywords
film
patterns
exposed
insulating film
oxidized
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56025663A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0136251B2 (cg-RX-API-DMAC10.html
Inventor
Minoru Taguchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP56025663A priority Critical patent/JPS57139928A/ja
Publication of JPS57139928A publication Critical patent/JPS57139928A/ja
Publication of JPH0136251B2 publication Critical patent/JPH0136251B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H10P50/00—

Landscapes

  • Bipolar Transistors (AREA)
  • Weting (AREA)
JP56025663A 1981-02-24 1981-02-24 Manufacture of semiconductor device Granted JPS57139928A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56025663A JPS57139928A (en) 1981-02-24 1981-02-24 Manufacture of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56025663A JPS57139928A (en) 1981-02-24 1981-02-24 Manufacture of semiconductor device

Publications (2)

Publication Number Publication Date
JPS57139928A true JPS57139928A (en) 1982-08-30
JPH0136251B2 JPH0136251B2 (cg-RX-API-DMAC10.html) 1989-07-31

Family

ID=12172031

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56025663A Granted JPS57139928A (en) 1981-02-24 1981-02-24 Manufacture of semiconductor device

Country Status (1)

Country Link
JP (1) JPS57139928A (cg-RX-API-DMAC10.html)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5160470A (ja) * 1974-11-22 1976-05-26 Mitsubishi Electric Corp Zetsuengeetohandotaisochino seizohoho

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5160470A (ja) * 1974-11-22 1976-05-26 Mitsubishi Electric Corp Zetsuengeetohandotaisochino seizohoho

Also Published As

Publication number Publication date
JPH0136251B2 (cg-RX-API-DMAC10.html) 1989-07-31

Similar Documents

Publication Publication Date Title
JPS52120782A (en) Manufacture of semiconductor device
JPS57130431A (en) Manufacture of semiconductor device
JPS6468932A (en) Dry etching
JPS57155769A (en) Manufacture of semiconductor device
JPS57139928A (en) Manufacture of semiconductor device
JPS56140641A (en) Manufacture of semiconductor device
JPS5776856A (en) Manufacture of semiconductor device
JPS57204146A (en) Manufacture of semiconductor device
JPS56111241A (en) Preparation of semiconductor device
JPS52124860A (en) Electrode formation method for semiconductor devices
JPS56108264A (en) Manufacture of semiconductor device
JPS57121231A (en) Manufacture of semiconductor device
JPS54139486A (en) Manufacture of semiconductor device
JPS535578A (en) Manufacture of semiconductor device
JPS57208156A (en) Manufacture of semiconductor device
JPS5737849A (en) Manufacture of semiconductor device
JPS5742144A (en) Manufacture of semiconductor device
JPS5610923A (en) Preparation of semiconductor device
JPS6411325A (en) Semiconductor device and manufacture thereof
JPS5779641A (en) Manufacture of semiconductor device
JPS5323559A (en) Production of compound semiconductor
JPS5691476A (en) Semiconductor
JPS5718362A (en) Semiconductor device and manufacture thereof
JPS56169348A (en) Semiconductor device
JPS5421173A (en) Manufacture for semiconductor having oxide film