JPS5367364A - Manufacture of semiconductor device - Google Patents

Manufacture of semiconductor device

Info

Publication number
JPS5367364A
JPS5367364A JP14273376A JP14273376A JPS5367364A JP S5367364 A JPS5367364 A JP S5367364A JP 14273376 A JP14273376 A JP 14273376A JP 14273376 A JP14273376 A JP 14273376A JP S5367364 A JPS5367364 A JP S5367364A
Authority
JP
Japan
Prior art keywords
manufacture
semiconductor device
mask
oxidized
silicon
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP14273376A
Other languages
Japanese (ja)
Other versions
JPS5828733B2 (en
Inventor
Akira Ando
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP14273376A priority Critical patent/JPS5828733B2/en
Publication of JPS5367364A publication Critical patent/JPS5367364A/en
Publication of JPS5828733B2 publication Critical patent/JPS5828733B2/en
Expired legal-status Critical Current

Links

Abstract

PURPOSE: On the silicon oxidized film formed on a substrate surface, the mask of a silicon nitride film is formed and selectively oxidized to form a finelysized impurity mask, thereby achieving the high integration.
COPYRIGHT: (C)1978,JPO&Japio
JP14273376A 1976-11-27 1976-11-27 Manufacturing method of semiconductor device Expired JPS5828733B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14273376A JPS5828733B2 (en) 1976-11-27 1976-11-27 Manufacturing method of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14273376A JPS5828733B2 (en) 1976-11-27 1976-11-27 Manufacturing method of semiconductor device

Publications (2)

Publication Number Publication Date
JPS5367364A true JPS5367364A (en) 1978-06-15
JPS5828733B2 JPS5828733B2 (en) 1983-06-17

Family

ID=15322304

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14273376A Expired JPS5828733B2 (en) 1976-11-27 1976-11-27 Manufacturing method of semiconductor device

Country Status (1)

Country Link
JP (1) JPS5828733B2 (en)

Also Published As

Publication number Publication date
JPS5828733B2 (en) 1983-06-17

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