JPS52101968A - Preparation of semiconductor device - Google Patents

Preparation of semiconductor device

Info

Publication number
JPS52101968A
JPS52101968A JP1868376A JP1868376A JPS52101968A JP S52101968 A JPS52101968 A JP S52101968A JP 1868376 A JP1868376 A JP 1868376A JP 1868376 A JP1868376 A JP 1868376A JP S52101968 A JPS52101968 A JP S52101968A
Authority
JP
Japan
Prior art keywords
preparation
semiconductor device
dispersion region
impurities
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1868376A
Other languages
Japanese (ja)
Inventor
Takashi Idogami
Keiji Inoue
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP1868376A priority Critical patent/JPS52101968A/en
Publication of JPS52101968A publication Critical patent/JPS52101968A/en
Pending legal-status Critical Current

Links

Landscapes

  • Element Separation (AREA)

Abstract

PURPOSE: To reduce redistribution of impurities in the dispersion region in the preparation of oxidation film while forming dispersion region in a substrate.
COPYRIGHT: (C)1977,JPO&Japio
JP1868376A 1976-02-23 1976-02-23 Preparation of semiconductor device Pending JPS52101968A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1868376A JPS52101968A (en) 1976-02-23 1976-02-23 Preparation of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1868376A JPS52101968A (en) 1976-02-23 1976-02-23 Preparation of semiconductor device

Publications (1)

Publication Number Publication Date
JPS52101968A true JPS52101968A (en) 1977-08-26

Family

ID=11978396

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1868376A Pending JPS52101968A (en) 1976-02-23 1976-02-23 Preparation of semiconductor device

Country Status (1)

Country Link
JP (1) JPS52101968A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6414915A (en) * 1987-07-08 1989-01-19 Nec Corp Forming method for diffused well

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4845176A (en) * 1971-10-11 1973-06-28

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4845176A (en) * 1971-10-11 1973-06-28

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6414915A (en) * 1987-07-08 1989-01-19 Nec Corp Forming method for diffused well

Similar Documents

Publication Publication Date Title
JPS52140280A (en) Semiconductor device
JPS5431273A (en) Manufacture of semiconductor device
JPS52101968A (en) Preparation of semiconductor device
JPS5363871A (en) Production of semiconductor device
JPS538072A (en) Semiconductor device
JPS51140572A (en) Semiconductor device
JPS52153669A (en) Photo mask of semiconductor integrated circuit
JPS5252370A (en) Fabrication of glass-sealed semiconductor device
JPS5335386A (en) Production of semiconductor device
JPS51122375A (en) Semiconductor device
JPS5311574A (en) Production of semiconductor device
JPS5377168A (en) Production of semiconductor device
JPS5363866A (en) Production of semiconductor device
JPS5260581A (en) Semiconductor device
JPS5273673A (en) Production of semiconductor device
JPS51112292A (en) Semiconductor device
JPS52179A (en) Method of fabricating semiconductor
JPS5210676A (en) Semiconductor device
JPS526081A (en) Semiconductor wafer
JPS5313364A (en) Manufacture of semiconductor device
JPS536570A (en) Preparation of semiconductor device
JPS5418670A (en) Manufacture of semiconductor device
JPS5338991A (en) Semiconductor device
JPS5367386A (en) Semiconductor device
JPS52153668A (en) Photo mask of semiconductor integrated circuit