JPS57136377A - Amorphous silicon nitride/amorphous silicon heterojunction photoelectric element - Google Patents

Amorphous silicon nitride/amorphous silicon heterojunction photoelectric element

Info

Publication number
JPS57136377A
JPS57136377A JP56022690A JP2269081A JPS57136377A JP S57136377 A JPS57136377 A JP S57136377A JP 56022690 A JP56022690 A JP 56022690A JP 2269081 A JP2269081 A JP 2269081A JP S57136377 A JPS57136377 A JP S57136377A
Authority
JP
Japan
Prior art keywords
amorphous silicon
photoelectric element
silicon nitride
silane
type
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56022690A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0544198B2 (enrdf_load_stackoverflow
Inventor
Yoshihiro Hamakawa
Yoshihisa Owada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kanegafuchi Chemical Industry Co Ltd
Original Assignee
Kanegafuchi Chemical Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kanegafuchi Chemical Industry Co Ltd filed Critical Kanegafuchi Chemical Industry Co Ltd
Priority to JP56022690A priority Critical patent/JPS57136377A/ja
Priority to US06/266,064 priority patent/US4388482A/en
Priority to CA000391378A priority patent/CA1176740A/en
Priority to AT81110111T priority patent/ATE38296T1/de
Priority to MX81190403A priority patent/MX157367A/es
Priority to AU78224/81A priority patent/AU558650B2/en
Priority to EP81110111A priority patent/EP0053402B1/en
Priority to DE8181110111T priority patent/DE3176919D1/de
Publication of JPS57136377A publication Critical patent/JPS57136377A/ja
Priority to SG65589A priority patent/SG65589G/en
Priority to HK796/89A priority patent/HK79689A/xx
Publication of JPH0544198B2 publication Critical patent/JPH0544198B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F10/00—Individual photovoltaic cells, e.g. solar cells
    • H10F10/10—Individual photovoltaic cells, e.g. solar cells having potential barriers
    • H10F10/17—Photovoltaic cells having only PIN junction potential barriers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F71/00—Manufacture or treatment of devices covered by this subclass
    • H10F71/10—Manufacture or treatment of devices covered by this subclass the devices comprising amorphous semiconductor material
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F71/00—Manufacture or treatment of devices covered by this subclass
    • H10F71/10—Manufacture or treatment of devices covered by this subclass the devices comprising amorphous semiconductor material
    • H10F71/103—Manufacture or treatment of devices covered by this subclass the devices comprising amorphous semiconductor material including only Group IV materials
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F71/00—Manufacture or treatment of devices covered by this subclass
    • H10F71/10—Manufacture or treatment of devices covered by this subclass the devices comprising amorphous semiconductor material
    • H10F71/103—Manufacture or treatment of devices covered by this subclass the devices comprising amorphous semiconductor material including only Group IV materials
    • H10F71/1035—Manufacture or treatment of devices covered by this subclass the devices comprising amorphous semiconductor material including only Group IV materials having multiple Group IV elements, e.g. SiGe or SiC
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y02E10/548—Amorphous silicon PV cells
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50—Manufacturing or production processes characterised by the final manufactured product

Landscapes

  • Photovoltaic Devices (AREA)
JP56022690A 1980-02-04 1981-02-17 Amorphous silicon nitride/amorphous silicon heterojunction photoelectric element Granted JPS57136377A (en)

Priority Applications (10)

Application Number Priority Date Filing Date Title
JP56022690A JPS57136377A (en) 1981-02-17 1981-02-17 Amorphous silicon nitride/amorphous silicon heterojunction photoelectric element
US06/266,064 US4388482A (en) 1981-01-29 1981-05-19 High-voltage photovoltaic cell having a heterojunction of amorphous semiconductor and amorphous silicon
CA000391378A CA1176740A (en) 1980-12-03 1981-12-02 High-voltage photovoltaic cell having a hetero junction of amorphous semiconductor and amorphous silicon
AU78224/81A AU558650B2 (en) 1980-12-03 1981-12-03 Amorphous semiconductor high-voltage photovoltaic cell
MX81190403A MX157367A (es) 1980-02-04 1981-12-03 Mejoras a celda fotovoltaica de tipo de silicio amorfo p-i-n
AT81110111T ATE38296T1 (de) 1980-12-03 1981-12-03 Photovolteische zelle vom pin-typ mit heterouebergang zwischen einer amorphen siliziumverbindung und amorphem silizium.
EP81110111A EP0053402B1 (en) 1980-12-03 1981-12-03 Pin photovoltaic cell having a hetero junction of amorphous siliconcompound and amorphous silicon
DE8181110111T DE3176919D1 (en) 1980-12-03 1981-12-03 Pin photovoltaic cell having a hetero junction of amorphous siliconcompound and amorphous silicon
SG65589A SG65589G (en) 1980-12-03 1989-09-20 Pin photovoltaic cell having a hetero junction of amorphous silicon compound and amorphous silicon
HK796/89A HK79689A (en) 1980-12-03 1989-10-05 Pin photovoltaic cell having a hetero junction of amorphous silicon compound and amorphous silicon

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56022690A JPS57136377A (en) 1981-02-17 1981-02-17 Amorphous silicon nitride/amorphous silicon heterojunction photoelectric element

Publications (2)

Publication Number Publication Date
JPS57136377A true JPS57136377A (en) 1982-08-23
JPH0544198B2 JPH0544198B2 (enrdf_load_stackoverflow) 1993-07-05

Family

ID=12089863

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56022690A Granted JPS57136377A (en) 1980-02-04 1981-02-17 Amorphous silicon nitride/amorphous silicon heterojunction photoelectric element

Country Status (1)

Country Link
JP (1) JPS57136377A (enrdf_load_stackoverflow)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57160175A (en) * 1981-03-28 1982-10-02 Semiconductor Energy Lab Co Ltd Photoelectric converter
JPS5868046U (ja) * 1981-11-02 1983-05-09 工業技術院長 光起電力素子
US4726851A (en) * 1984-11-27 1988-02-23 Toa Nenryo Kogyo K.K. Amorphous silicon semiconductor film and production process thereof
JPS6384074A (ja) * 1986-09-26 1988-04-14 Sanyo Electric Co Ltd 光起電力装置
JPH0370185A (ja) * 1989-08-09 1991-03-26 Sanyo Electric Co Ltd 非晶質半導体装置
JP2009076939A (ja) * 2008-12-22 2009-04-09 Sharp Corp 光電変換装置およびその製造方法
WO2009081713A1 (ja) * 2007-12-26 2009-07-02 Mitsubishi Heavy Industries, Ltd. 光電変換装置及びその製造方法
JP2010118695A (ja) * 2010-02-22 2010-05-27 Mitsubishi Heavy Ind Ltd 光電変換装置及びその製造方法
US7915520B2 (en) 2004-03-24 2011-03-29 Sharp Kabushiki Kaisha Photoelectric conversion device and manufacturing method thereof

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5464981A (en) * 1977-10-12 1979-05-25 Energy Conversion Devices Inc High temperature amorphous semiconductor member and method of producing same
JPS5513938A (en) * 1978-07-17 1980-01-31 Shunpei Yamazaki Photoelectronic conversion semiconductor device and its manufacturing method
JPS5513939A (en) * 1978-07-17 1980-01-31 Shunpei Yamazaki Photoelectronic conversion semiconductor device

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5464981A (en) * 1977-10-12 1979-05-25 Energy Conversion Devices Inc High temperature amorphous semiconductor member and method of producing same
JPS5513938A (en) * 1978-07-17 1980-01-31 Shunpei Yamazaki Photoelectronic conversion semiconductor device and its manufacturing method
JPS5513939A (en) * 1978-07-17 1980-01-31 Shunpei Yamazaki Photoelectronic conversion semiconductor device

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57160175A (en) * 1981-03-28 1982-10-02 Semiconductor Energy Lab Co Ltd Photoelectric converter
JPS5868046U (ja) * 1981-11-02 1983-05-09 工業技術院長 光起電力素子
US4726851A (en) * 1984-11-27 1988-02-23 Toa Nenryo Kogyo K.K. Amorphous silicon semiconductor film and production process thereof
JPS6384074A (ja) * 1986-09-26 1988-04-14 Sanyo Electric Co Ltd 光起電力装置
JPH0370185A (ja) * 1989-08-09 1991-03-26 Sanyo Electric Co Ltd 非晶質半導体装置
US7915520B2 (en) 2004-03-24 2011-03-29 Sharp Kabushiki Kaisha Photoelectric conversion device and manufacturing method thereof
WO2009081713A1 (ja) * 2007-12-26 2009-07-02 Mitsubishi Heavy Industries, Ltd. 光電変換装置及びその製造方法
JP2009158667A (ja) * 2007-12-26 2009-07-16 Mitsubishi Heavy Ind Ltd 光電変換装置及びその製造方法
JP2009076939A (ja) * 2008-12-22 2009-04-09 Sharp Corp 光電変換装置およびその製造方法
JP2010118695A (ja) * 2010-02-22 2010-05-27 Mitsubishi Heavy Ind Ltd 光電変換装置及びその製造方法

Also Published As

Publication number Publication date
JPH0544198B2 (enrdf_load_stackoverflow) 1993-07-05

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