JPS57136377A - Amorphous silicon nitride/amorphous silicon heterojunction photoelectric element - Google Patents
Amorphous silicon nitride/amorphous silicon heterojunction photoelectric elementInfo
- Publication number
- JPS57136377A JPS57136377A JP56022690A JP2269081A JPS57136377A JP S57136377 A JPS57136377 A JP S57136377A JP 56022690 A JP56022690 A JP 56022690A JP 2269081 A JP2269081 A JP 2269081A JP S57136377 A JPS57136377 A JP S57136377A
- Authority
- JP
- Japan
- Prior art keywords
- amorphous silicon
- photoelectric element
- silicon nitride
- silane
- type
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229910021417 amorphous silicon Inorganic materials 0.000 title abstract 7
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 title abstract 3
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 abstract 4
- 229910000077 silane Inorganic materials 0.000 abstract 4
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 abstract 2
- 238000000034 method Methods 0.000 abstract 2
- 239000000203 mixture Substances 0.000 abstract 2
- 150000001875 compounds Chemical class 0.000 abstract 1
- 238000000354 decomposition reaction Methods 0.000 abstract 1
- 239000004065 semiconductor Substances 0.000 abstract 1
- 239000010409 thin film Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/06—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers
- H01L31/075—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers the potential barriers being only of the PIN type, e.g. amorphous silicon PIN solar cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/20—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof such devices or parts thereof comprising amorphous semiconductor materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/20—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof such devices or parts thereof comprising amorphous semiconductor materials
- H01L31/202—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof such devices or parts thereof comprising amorphous semiconductor materials including only elements of Group IV of the Periodic Table
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/20—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof such devices or parts thereof comprising amorphous semiconductor materials
- H01L31/202—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof such devices or parts thereof comprising amorphous semiconductor materials including only elements of Group IV of the Periodic Table
- H01L31/204—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof such devices or parts thereof comprising amorphous semiconductor materials including only elements of Group IV of the Periodic Table including AIVBIV alloys, e.g. SiGe, SiC
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/548—Amorphous silicon PV cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Photovoltaic Devices (AREA)
Abstract
PURPOSE:To improve efficiency by a method wherein a doped thin film of amorphous silicon nitride which is obtained by plasma decomposing mixture of hydrogenated compounds of silane and silane fluoride is used as one of P type and N type layers in a P-i-N junction photoelectric element. CONSTITUTION:When a P-I-N junction structure in which P type and N type doped semiconductors are brought into a junction with an I-layer made from intrinsic amorphous silicon (a-Si) which is obtained by glow discharge decomposition of silane or its derivatives or silane fluoride or its derivatives or their mixture is formed, at least on one irradiated side, amorphous silicon nitride is used to form a heterojunction photoelectric element of (a-Si1-xNx) and (a-Si). By this method an efficiency of solar battery or the like is improved.
Priority Applications (10)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56022690A JPS57136377A (en) | 1981-02-17 | 1981-02-17 | Amorphous silicon nitride/amorphous silicon heterojunction photoelectric element |
US06/266,064 US4388482A (en) | 1981-01-29 | 1981-05-19 | High-voltage photovoltaic cell having a heterojunction of amorphous semiconductor and amorphous silicon |
CA000391378A CA1176740A (en) | 1980-12-03 | 1981-12-02 | High-voltage photovoltaic cell having a hetero junction of amorphous semiconductor and amorphous silicon |
DE8181110111T DE3176919D1 (en) | 1980-12-03 | 1981-12-03 | Pin photovoltaic cell having a hetero junction of amorphous siliconcompound and amorphous silicon |
AU78224/81A AU558650B2 (en) | 1980-12-03 | 1981-12-03 | Amorphous semiconductor high-voltage photovoltaic cell |
EP81110111A EP0053402B1 (en) | 1980-12-03 | 1981-12-03 | Pin photovoltaic cell having a hetero junction of amorphous siliconcompound and amorphous silicon |
AT81110111T ATE38296T1 (en) | 1980-12-03 | 1981-12-03 | PIN TYPE PHOTOVOLTIC CELL WITH HETEROJUNION BETWEEN AN AMORPHOUS SILICON COMPOUND AND AMORPHEN SILICON. |
MX81190403A MX157367A (en) | 1980-02-04 | 1981-12-03 | IMPROVEMENTS TO AMORPHO P-I-N SILICON PHOTOVOLTAIC CELL |
SG65589A SG65589G (en) | 1980-12-03 | 1989-09-20 | Pin photovoltaic cell having a hetero junction of amorphous silicon compound and amorphous silicon |
HK796/89A HK79689A (en) | 1980-12-03 | 1989-10-05 | Pin photovoltaic cell having a hetero junction of amorphous silicon compound and amorphous silicon |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56022690A JPS57136377A (en) | 1981-02-17 | 1981-02-17 | Amorphous silicon nitride/amorphous silicon heterojunction photoelectric element |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57136377A true JPS57136377A (en) | 1982-08-23 |
JPH0544198B2 JPH0544198B2 (en) | 1993-07-05 |
Family
ID=12089863
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP56022690A Granted JPS57136377A (en) | 1980-02-04 | 1981-02-17 | Amorphous silicon nitride/amorphous silicon heterojunction photoelectric element |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57136377A (en) |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57160175A (en) * | 1981-03-28 | 1982-10-02 | Semiconductor Energy Lab Co Ltd | Photoelectric converter |
JPS5868046U (en) * | 1981-11-02 | 1983-05-09 | 工業技術院長 | photovoltaic element |
US4726851A (en) * | 1984-11-27 | 1988-02-23 | Toa Nenryo Kogyo K.K. | Amorphous silicon semiconductor film and production process thereof |
JPS6384074A (en) * | 1986-09-26 | 1988-04-14 | Sanyo Electric Co Ltd | Photovoltaic device |
JPH0370185A (en) * | 1989-08-09 | 1991-03-26 | Sanyo Electric Co Ltd | Amorphous semiconductor device |
JP2009076939A (en) * | 2008-12-22 | 2009-04-09 | Sharp Corp | Photoelectric conversion device and its manufacturing method |
WO2009081713A1 (en) * | 2007-12-26 | 2009-07-02 | Mitsubishi Heavy Industries, Ltd. | Photoelectric converting device and process for producing the photoelectric converting device |
JP2010118695A (en) * | 2010-02-22 | 2010-05-27 | Mitsubishi Heavy Ind Ltd | Photoelectric conversion apparatus, and method of manufacturing the same |
US7915520B2 (en) | 2004-03-24 | 2011-03-29 | Sharp Kabushiki Kaisha | Photoelectric conversion device and manufacturing method thereof |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5464981A (en) * | 1977-10-12 | 1979-05-25 | Energy Conversion Devices Inc | High temperature amorphous semiconductor member and method of producing same |
JPS5513938A (en) * | 1978-07-17 | 1980-01-31 | Shunpei Yamazaki | Photoelectronic conversion semiconductor device and its manufacturing method |
JPS5513939A (en) * | 1978-07-17 | 1980-01-31 | Shunpei Yamazaki | Photoelectronic conversion semiconductor device |
-
1981
- 1981-02-17 JP JP56022690A patent/JPS57136377A/en active Granted
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5464981A (en) * | 1977-10-12 | 1979-05-25 | Energy Conversion Devices Inc | High temperature amorphous semiconductor member and method of producing same |
JPS5513938A (en) * | 1978-07-17 | 1980-01-31 | Shunpei Yamazaki | Photoelectronic conversion semiconductor device and its manufacturing method |
JPS5513939A (en) * | 1978-07-17 | 1980-01-31 | Shunpei Yamazaki | Photoelectronic conversion semiconductor device |
Cited By (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57160175A (en) * | 1981-03-28 | 1982-10-02 | Semiconductor Energy Lab Co Ltd | Photoelectric converter |
JPS6230714B2 (en) * | 1981-03-28 | 1987-07-03 | Handotai Energy Kenkyusho | |
JPS5868046U (en) * | 1981-11-02 | 1983-05-09 | 工業技術院長 | photovoltaic element |
JPS629747Y2 (en) * | 1981-11-02 | 1987-03-06 | ||
US4726851A (en) * | 1984-11-27 | 1988-02-23 | Toa Nenryo Kogyo K.K. | Amorphous silicon semiconductor film and production process thereof |
JPS6384074A (en) * | 1986-09-26 | 1988-04-14 | Sanyo Electric Co Ltd | Photovoltaic device |
JPH0370185A (en) * | 1989-08-09 | 1991-03-26 | Sanyo Electric Co Ltd | Amorphous semiconductor device |
US7915520B2 (en) | 2004-03-24 | 2011-03-29 | Sharp Kabushiki Kaisha | Photoelectric conversion device and manufacturing method thereof |
WO2009081713A1 (en) * | 2007-12-26 | 2009-07-02 | Mitsubishi Heavy Industries, Ltd. | Photoelectric converting device and process for producing the photoelectric converting device |
JP2009158667A (en) * | 2007-12-26 | 2009-07-16 | Mitsubishi Heavy Ind Ltd | Photoelectric converter and method of producing the same |
JP2009076939A (en) * | 2008-12-22 | 2009-04-09 | Sharp Corp | Photoelectric conversion device and its manufacturing method |
JP2010118695A (en) * | 2010-02-22 | 2010-05-27 | Mitsubishi Heavy Ind Ltd | Photoelectric conversion apparatus, and method of manufacturing the same |
Also Published As
Publication number | Publication date |
---|---|
JPH0544198B2 (en) | 1993-07-05 |
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