JPS57132353A - Semiconductor integrated circuit - Google Patents
Semiconductor integrated circuitInfo
- Publication number
- JPS57132353A JPS57132353A JP56018747A JP1874781A JPS57132353A JP S57132353 A JPS57132353 A JP S57132353A JP 56018747 A JP56018747 A JP 56018747A JP 1874781 A JP1874781 A JP 1874781A JP S57132353 A JPS57132353 A JP S57132353A
- Authority
- JP
- Japan
- Prior art keywords
- type
- transistor
- transistors
- collector
- regions
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body
- H01L27/08—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including only semiconductor components of a single kind
- H01L27/082—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including only semiconductor components of a single kind including bipolar components only
- H01L27/0823—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including only semiconductor components of a single kind including bipolar components only including vertical bipolar transistors only
Abstract
PURPOSE:To minimize area by forming the collectors of two transistors of an ECL circuit into one island and joining both emitters to a collector of a constant-current transistor. CONSTITUTION:The emitter regions of the transistors Q1, Q2, to which input voltage Vin and reference voltage VREF are each applied, and the collector region of the constant-current transistor Q3 are shaped onto a P type semiconductor subtrate 21 as an N type epitaxial layer 22. The P type base regions 24a, 24c, 24b of each transistor Q1, Q2, Q3 are formed to the layer 22, and the N type collector regions 26, 27 of the transistors Q1, Q2 and the N type emitter region 25 of the transistor Q3 are shaped severally to the P type base regions 24a, 24c, 24b. The emitters of the transistors Q1, Q2 and the collector of the transistor Q3 are connected by the N type layer 22 and an N<+> buried layer 23, and isolation regions among these electrode wiring and elements are unnecessitated.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56018747A JPS57132353A (en) | 1981-02-09 | 1981-02-09 | Semiconductor integrated circuit |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56018747A JPS57132353A (en) | 1981-02-09 | 1981-02-09 | Semiconductor integrated circuit |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57132353A true JPS57132353A (en) | 1982-08-16 |
JPH0131304B2 JPH0131304B2 (en) | 1989-06-26 |
Family
ID=11980239
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP56018747A Granted JPS57132353A (en) | 1981-02-09 | 1981-02-09 | Semiconductor integrated circuit |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57132353A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5160996A (en) * | 1987-10-08 | 1992-11-03 | Matsushita Electric Industrial Co., Inc. | Structure and method of manufacture for semiconductor device |
US5292671A (en) * | 1987-10-08 | 1994-03-08 | Matsushita Electric Industrial, Co., Ltd. | Method of manufacture for semiconductor device by forming deep and shallow regions |
JPH077082A (en) * | 1992-06-29 | 1995-01-10 | Korea Electron & Telecommun Res Inst | Semiconductor device |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5434785A (en) * | 1977-08-24 | 1979-03-14 | Hitachi Ltd | Semiconductor integrated circuit device |
-
1981
- 1981-02-09 JP JP56018747A patent/JPS57132353A/en active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5434785A (en) * | 1977-08-24 | 1979-03-14 | Hitachi Ltd | Semiconductor integrated circuit device |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5160996A (en) * | 1987-10-08 | 1992-11-03 | Matsushita Electric Industrial Co., Inc. | Structure and method of manufacture for semiconductor device |
US5292671A (en) * | 1987-10-08 | 1994-03-08 | Matsushita Electric Industrial, Co., Ltd. | Method of manufacture for semiconductor device by forming deep and shallow regions |
JPH077082A (en) * | 1992-06-29 | 1995-01-10 | Korea Electron & Telecommun Res Inst | Semiconductor device |
Also Published As
Publication number | Publication date |
---|---|
JPH0131304B2 (en) | 1989-06-26 |
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