JPS5482178A - Electrostatic inductive intergrated circuit device - Google Patents
Electrostatic inductive intergrated circuit deviceInfo
- Publication number
- JPS5482178A JPS5482178A JP15005577A JP15005577A JPS5482178A JP S5482178 A JPS5482178 A JP S5482178A JP 15005577 A JP15005577 A JP 15005577A JP 15005577 A JP15005577 A JP 15005577A JP S5482178 A JPS5482178 A JP S5482178A
- Authority
- JP
- Japan
- Prior art keywords
- region
- terminal
- plus
- type
- attached
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
- H01L27/0203—Particular design considerations for integrated circuits
- H01L27/0214—Particular design considerations for integrated circuits for internal polarisation, e.g. I2L
- H01L27/0218—Particular design considerations for integrated circuits for internal polarisation, e.g. I2L of field effect structures
- H01L27/0225—Charge injection in static induction transistor logic structures [SITL]
Abstract
PURPOSE:To give versatility to the logic function by adding the NOR logic newly to the AND and NOT logics which are all provided on the same semiconductor substrate forming the electrostatic inductive transistor logic. CONSTITUTION:N-type layer 12 is epitaxial-grown on N<+>-type semiconductor sub- strate 11, and then P-type region 13a and 13b to become injectors later, divided P-type gate region 13c and 13d plus N<+>-type drain region 14 positioning the above mentioned regions are formed through diffusion. Injector terminal IS is attached to region 13a and 13b each; input terminal G1 and G2 are attached to region 13c and 13d; and output terminal D is attached to region 14 respectively. And a lateral PNP transistor is constituted with region 13a and 13c, layer 12, region 13d and 13b plus layer 12 to be used for the contant current source. Furthermore, the switching element featuring the similar function to FET is formed with region 14 plus divided region 13c and 13d. Thus, the two-input NOR function can be obtained at the swiching element with terminal G1 and G2 used as the input terminals plus terminal D used as the output terminal restpectively.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15005577A JPS5482178A (en) | 1977-12-14 | 1977-12-14 | Electrostatic inductive intergrated circuit device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15005577A JPS5482178A (en) | 1977-12-14 | 1977-12-14 | Electrostatic inductive intergrated circuit device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5482178A true JPS5482178A (en) | 1979-06-30 |
JPS5733874B2 JPS5733874B2 (en) | 1982-07-20 |
Family
ID=15488512
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15005577A Granted JPS5482178A (en) | 1977-12-14 | 1977-12-14 | Electrostatic inductive intergrated circuit device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5482178A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56500991A (en) * | 1979-08-10 | 1981-07-16 | ||
JPS56158469A (en) * | 1980-05-10 | 1981-12-07 | Nippon Telegr & Teleph Corp <Ntt> | Semiconductor logic device |
JPS57181168A (en) * | 1981-05-01 | 1982-11-08 | Nippon Telegr & Teleph Corp <Ntt> | Junction type field effect logical circuit element |
US5032538A (en) * | 1979-08-10 | 1991-07-16 | Massachusetts Institute Of Technology | Semiconductor embedded layer technology utilizing selective epitaxial growth methods |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS545681A (en) * | 1977-06-15 | 1979-01-17 | Mitsubishi Electric Corp | Semiconductor memory cell |
-
1977
- 1977-12-14 JP JP15005577A patent/JPS5482178A/en active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS545681A (en) * | 1977-06-15 | 1979-01-17 | Mitsubishi Electric Corp | Semiconductor memory cell |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56500991A (en) * | 1979-08-10 | 1981-07-16 | ||
US5032538A (en) * | 1979-08-10 | 1991-07-16 | Massachusetts Institute Of Technology | Semiconductor embedded layer technology utilizing selective epitaxial growth methods |
JPS56158469A (en) * | 1980-05-10 | 1981-12-07 | Nippon Telegr & Teleph Corp <Ntt> | Semiconductor logic device |
JPS57181168A (en) * | 1981-05-01 | 1982-11-08 | Nippon Telegr & Teleph Corp <Ntt> | Junction type field effect logical circuit element |
Also Published As
Publication number | Publication date |
---|---|
JPS5733874B2 (en) | 1982-07-20 |
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