JPS57128086A - Magneto-electric transducer element - Google Patents
Magneto-electric transducer elementInfo
- Publication number
- JPS57128086A JPS57128086A JP56012746A JP1274681A JPS57128086A JP S57128086 A JPS57128086 A JP S57128086A JP 56012746 A JP56012746 A JP 56012746A JP 1274681 A JP1274681 A JP 1274681A JP S57128086 A JPS57128086 A JP S57128086A
- Authority
- JP
- Japan
- Prior art keywords
- electrodes
- substrate
- voltage electrodes
- current electrodes
- dynamic layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N52/00—Hall-effect devices
- H10N52/101—Semiconductor Hall-effect devices
Landscapes
- Hall/Mr Elements (AREA)
Abstract
PURPOSE:To improve the characteristics of an element by a method wherein a distance larger than generally accepted is provided between each of current electrodes and voltage electrodes and the substrate periphery so that dicing caused crush may not affect the dynamic layer and electric field concentration containing the electrodes. CONSTITUTION:A cross shaped GaAs dynamic layer 22 is formed by the epitaxial growth technique at the central part of a square (100) GaAs substrate 21. On the layer 22, current electrodes 23, 24 are provided at the two extremes of the power transmitting segment (a) and voltage electrodes 25, 26 are provided at the two extremes of the output transmitting segment (b). The dicing lines 21a-21d along the four external sides of the square substrate 21 form an angle of 45 deg. with the directions (x) and (y) of the cleavage surfaces and the chip generation widths along the cleavage surface directions (x) and (y) are to be roughly equal with each other. A distance of not less than 10mum is to be provided between each of the current electrodes 23, 24 and voltage electrodes 25, 26, and the periphery of the substrate 21. This setup prevents dicing caused crush from affecting the dynamic layer 22 and the center of electric field concentration where the current electrodes 23, 24 and voltage electrodes 25, 26 are located, improving device characteristics and reliability.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56012746A JPS57128086A (en) | 1981-01-30 | 1981-01-30 | Magneto-electric transducer element |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56012746A JPS57128086A (en) | 1981-01-30 | 1981-01-30 | Magneto-electric transducer element |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS57128086A true JPS57128086A (en) | 1982-08-09 |
Family
ID=11813981
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP56012746A Pending JPS57128086A (en) | 1981-01-30 | 1981-01-30 | Magneto-electric transducer element |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57128086A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0365599A (en) * | 1989-08-02 | 1991-03-20 | Toshiba Corp | Iii-v semiconductor pellet |
WO2000052424A1 (en) * | 1999-02-26 | 2000-09-08 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Hall sensor with a reduced offset signal |
-
1981
- 1981-01-30 JP JP56012746A patent/JPS57128086A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0365599A (en) * | 1989-08-02 | 1991-03-20 | Toshiba Corp | Iii-v semiconductor pellet |
JPH0529640B2 (en) * | 1989-08-02 | 1993-05-06 | Tokyo Shibaura Electric Co | |
WO2000052424A1 (en) * | 1999-02-26 | 2000-09-08 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Hall sensor with a reduced offset signal |
CZ301988B6 (en) * | 1999-02-26 | 2010-08-25 | Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung E. V. | Hall sensor with reduced offset signal |
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