JPS57128086A - Magneto-electric transducer element - Google Patents

Magneto-electric transducer element

Info

Publication number
JPS57128086A
JPS57128086A JP56012746A JP1274681A JPS57128086A JP S57128086 A JPS57128086 A JP S57128086A JP 56012746 A JP56012746 A JP 56012746A JP 1274681 A JP1274681 A JP 1274681A JP S57128086 A JPS57128086 A JP S57128086A
Authority
JP
Japan
Prior art keywords
electrodes
substrate
voltage electrodes
current electrodes
dynamic layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP56012746A
Other languages
Japanese (ja)
Inventor
Toshihiro Suzuki
Yutaka Tomizawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP56012746A priority Critical patent/JPS57128086A/en
Publication of JPS57128086A publication Critical patent/JPS57128086A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N52/00Hall-effect devices
    • H10N52/101Semiconductor Hall-effect devices

Landscapes

  • Hall/Mr Elements (AREA)

Abstract

PURPOSE:To improve the characteristics of an element by a method wherein a distance larger than generally accepted is provided between each of current electrodes and voltage electrodes and the substrate periphery so that dicing caused crush may not affect the dynamic layer and electric field concentration containing the electrodes. CONSTITUTION:A cross shaped GaAs dynamic layer 22 is formed by the epitaxial growth technique at the central part of a square (100) GaAs substrate 21. On the layer 22, current electrodes 23, 24 are provided at the two extremes of the power transmitting segment (a) and voltage electrodes 25, 26 are provided at the two extremes of the output transmitting segment (b). The dicing lines 21a-21d along the four external sides of the square substrate 21 form an angle of 45 deg. with the directions (x) and (y) of the cleavage surfaces and the chip generation widths along the cleavage surface directions (x) and (y) are to be roughly equal with each other. A distance of not less than 10mum is to be provided between each of the current electrodes 23, 24 and voltage electrodes 25, 26, and the periphery of the substrate 21. This setup prevents dicing caused crush from affecting the dynamic layer 22 and the center of electric field concentration where the current electrodes 23, 24 and voltage electrodes 25, 26 are located, improving device characteristics and reliability.
JP56012746A 1981-01-30 1981-01-30 Magneto-electric transducer element Pending JPS57128086A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56012746A JPS57128086A (en) 1981-01-30 1981-01-30 Magneto-electric transducer element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56012746A JPS57128086A (en) 1981-01-30 1981-01-30 Magneto-electric transducer element

Publications (1)

Publication Number Publication Date
JPS57128086A true JPS57128086A (en) 1982-08-09

Family

ID=11813981

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56012746A Pending JPS57128086A (en) 1981-01-30 1981-01-30 Magneto-electric transducer element

Country Status (1)

Country Link
JP (1) JPS57128086A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0365599A (en) * 1989-08-02 1991-03-20 Toshiba Corp Iii-v semiconductor pellet
WO2000052424A1 (en) * 1999-02-26 2000-09-08 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Hall sensor with a reduced offset signal

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0365599A (en) * 1989-08-02 1991-03-20 Toshiba Corp Iii-v semiconductor pellet
JPH0529640B2 (en) * 1989-08-02 1993-05-06 Tokyo Shibaura Electric Co
WO2000052424A1 (en) * 1999-02-26 2000-09-08 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Hall sensor with a reduced offset signal
CZ301988B6 (en) * 1999-02-26 2010-08-25 Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung E. V. Hall sensor with reduced offset signal

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