JPS5712521A - Drawing device of figure by electron beam - Google Patents

Drawing device of figure by electron beam

Info

Publication number
JPS5712521A
JPS5712521A JP8583580A JP8583580A JPS5712521A JP S5712521 A JPS5712521 A JP S5712521A JP 8583580 A JP8583580 A JP 8583580A JP 8583580 A JP8583580 A JP 8583580A JP S5712521 A JPS5712521 A JP S5712521A
Authority
JP
Japan
Prior art keywords
slits
plural
time
deflector
controller
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8583580A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6235263B2 (enrdf_load_stackoverflow
Inventor
Akihira Fujinami
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP8583580A priority Critical patent/JPS5712521A/ja
Publication of JPS5712521A publication Critical patent/JPS5712521A/ja
Publication of JPS6235263B2 publication Critical patent/JPS6235263B2/ja
Granted legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Analytical Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Electron Beam Exposure (AREA)
JP8583580A 1980-06-26 1980-06-26 Drawing device of figure by electron beam Granted JPS5712521A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8583580A JPS5712521A (en) 1980-06-26 1980-06-26 Drawing device of figure by electron beam

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8583580A JPS5712521A (en) 1980-06-26 1980-06-26 Drawing device of figure by electron beam

Publications (2)

Publication Number Publication Date
JPS5712521A true JPS5712521A (en) 1982-01-22
JPS6235263B2 JPS6235263B2 (enrdf_load_stackoverflow) 1987-07-31

Family

ID=13869909

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8583580A Granted JPS5712521A (en) 1980-06-26 1980-06-26 Drawing device of figure by electron beam

Country Status (1)

Country Link
JP (1) JPS5712521A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006128564A (ja) * 2004-11-01 2006-05-18 Toshiba Corp 荷電ビーム露光装置および荷電ビーム制御方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5469075A (en) * 1977-11-14 1979-06-02 Hitachi Ltd Electron beam drawing device

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5469075A (en) * 1977-11-14 1979-06-02 Hitachi Ltd Electron beam drawing device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006128564A (ja) * 2004-11-01 2006-05-18 Toshiba Corp 荷電ビーム露光装置および荷電ビーム制御方法

Also Published As

Publication number Publication date
JPS6235263B2 (enrdf_load_stackoverflow) 1987-07-31

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