JPS6235263B2 - - Google Patents

Info

Publication number
JPS6235263B2
JPS6235263B2 JP55085835A JP8583580A JPS6235263B2 JP S6235263 B2 JPS6235263 B2 JP S6235263B2 JP 55085835 A JP55085835 A JP 55085835A JP 8583580 A JP8583580 A JP 8583580A JP S6235263 B2 JPS6235263 B2 JP S6235263B2
Authority
JP
Japan
Prior art keywords
slit
electron beam
electron
plates
deflector
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP55085835A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5712521A (en
Inventor
Akihira Fujinami
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP8583580A priority Critical patent/JPS5712521A/ja
Publication of JPS5712521A publication Critical patent/JPS5712521A/ja
Publication of JPS6235263B2 publication Critical patent/JPS6235263B2/ja
Granted legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Analytical Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Electron Beam Exposure (AREA)
JP8583580A 1980-06-26 1980-06-26 Drawing device of figure by electron beam Granted JPS5712521A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8583580A JPS5712521A (en) 1980-06-26 1980-06-26 Drawing device of figure by electron beam

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8583580A JPS5712521A (en) 1980-06-26 1980-06-26 Drawing device of figure by electron beam

Publications (2)

Publication Number Publication Date
JPS5712521A JPS5712521A (en) 1982-01-22
JPS6235263B2 true JPS6235263B2 (enrdf_load_stackoverflow) 1987-07-31

Family

ID=13869909

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8583580A Granted JPS5712521A (en) 1980-06-26 1980-06-26 Drawing device of figure by electron beam

Country Status (1)

Country Link
JP (1) JPS5712521A (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006128564A (ja) * 2004-11-01 2006-05-18 Toshiba Corp 荷電ビーム露光装置および荷電ビーム制御方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5469075A (en) * 1977-11-14 1979-06-02 Hitachi Ltd Electron beam drawing device

Also Published As

Publication number Publication date
JPS5712521A (en) 1982-01-22

Similar Documents

Publication Publication Date Title
JP2001527701A (ja) マイクロカラムアレイを使用する半導体ダイの直接描画方法及び装置
KR102745307B1 (ko) 멀티 전자 빔 묘화 장치 및 멀티 전자 빔 묘화 방법
JP2837515B2 (ja) 電子ビーム露光装置
US4282437A (en) Charged particle beam lithography
JPS6237808B2 (enrdf_load_stackoverflow)
JPH0554251B2 (enrdf_load_stackoverflow)
JPS6235263B2 (enrdf_load_stackoverflow)
JP7110831B2 (ja) マルチ荷電粒子ビーム描画装置及びマルチ荷電粒子ビーム描画方法
JPH0744144B2 (ja) 電子像投射形成装置
US5969362A (en) High-throughput direct-write electron-beam exposure system and method
US9281161B2 (en) Electron beam writing apparatus and electron beam writing method
JP3006554B2 (ja) 電子線露光方法
JP3246610B2 (ja) 荷電粒子ビーム露光方法および露光装置
JPH0279411A (ja) マルチ荷電子ビーム露光装置
JP2005302868A (ja) 電子ビーム描画方法および装置
JP3290699B2 (ja) パターン形成方法
JPH0697054A (ja) 電子線描画装置
JPS6010726A (ja) 電子ビ−ム露光方法
JP2898726B2 (ja) 荷電粒子ビーム露光方法
JPH0613301A (ja) 電子線描画装置
JPS63185027A (ja) 荷電粒子ビーム描画方法
JPH07211609A (ja) 電子ビーム描画装置及び電子ビーム描画方法
JPS5783030A (en) Exposure of electron beam
JPH0194619A (ja) 電子ビーム描画装置のショット制御回路
JPH0794377A (ja) 電子ビーム露光装置