JPS6235263B2 - - Google Patents
Info
- Publication number
- JPS6235263B2 JPS6235263B2 JP55085835A JP8583580A JPS6235263B2 JP S6235263 B2 JPS6235263 B2 JP S6235263B2 JP 55085835 A JP55085835 A JP 55085835A JP 8583580 A JP8583580 A JP 8583580A JP S6235263 B2 JPS6235263 B2 JP S6235263B2
- Authority
- JP
- Japan
- Prior art keywords
- slit
- electron beam
- electron
- plates
- deflector
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
- H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Analytical Chemistry (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Electron Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8583580A JPS5712521A (en) | 1980-06-26 | 1980-06-26 | Drawing device of figure by electron beam |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8583580A JPS5712521A (en) | 1980-06-26 | 1980-06-26 | Drawing device of figure by electron beam |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5712521A JPS5712521A (en) | 1982-01-22 |
| JPS6235263B2 true JPS6235263B2 (enrdf_load_stackoverflow) | 1987-07-31 |
Family
ID=13869909
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8583580A Granted JPS5712521A (en) | 1980-06-26 | 1980-06-26 | Drawing device of figure by electron beam |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5712521A (enrdf_load_stackoverflow) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006128564A (ja) * | 2004-11-01 | 2006-05-18 | Toshiba Corp | 荷電ビーム露光装置および荷電ビーム制御方法 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5469075A (en) * | 1977-11-14 | 1979-06-02 | Hitachi Ltd | Electron beam drawing device |
-
1980
- 1980-06-26 JP JP8583580A patent/JPS5712521A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5712521A (en) | 1982-01-22 |
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