JPS57122508A - Manufacture magnetic bubble device - Google Patents
Manufacture magnetic bubble deviceInfo
- Publication number
- JPS57122508A JPS57122508A JP863181A JP863181A JPS57122508A JP S57122508 A JPS57122508 A JP S57122508A JP 863181 A JP863181 A JP 863181A JP 863181 A JP863181 A JP 863181A JP S57122508 A JPS57122508 A JP S57122508A
- Authority
- JP
- Japan
- Prior art keywords
- film
- pattern
- permalloy
- insulator
- bubble device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
- H01F41/32—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying conductive, insulating or magnetic material on a magnetic film, specially adapted for a thin magnetic film
- H01F41/34—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying conductive, insulating or magnetic material on a magnetic film, specially adapted for a thin magnetic film in patterns, e.g. by lithography
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Thin Magnetic Films (AREA)
Abstract
PURPOSE:To improve magnetic characteristic for preventing deterioration of the magnetic characteristic by a method wherein after forming a conductive pattern, an insulator film of organic substance is deposited, on which an insulator film of inorganic substance and a permalloy film are produced successively. CONSTITUTION:A SiO2 film as an insulator film of inorganic substance 2 is formed by RF sputtering process on a garnet film 1 for a bubble device, and further an Al-Cu conductive film is coated on the SiO2 film. Next, a film 3 is formed in a desired pattern by fine pattern technology, coating with polyimide resin 4 as the insulator film of organic substance by spin coatin process. Then, it is cured, for example, at 360 deg.C for 120min. After this, the SiO2 film 6 and the permalloy film 5 are formed successively by RF sputtering, and a permalloy pattern is produced by fine pattern technology. A protective film is provded all over the surfaces including the pattern 5, and parts of the protective coating at bonding pads and the insulator film of organic substance are removed for forming a magnetic bubble device.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP863181A JPS57122508A (en) | 1981-01-23 | 1981-01-23 | Manufacture magnetic bubble device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP863181A JPS57122508A (en) | 1981-01-23 | 1981-01-23 | Manufacture magnetic bubble device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS57122508A true JPS57122508A (en) | 1982-07-30 |
Family
ID=11698294
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP863181A Pending JPS57122508A (en) | 1981-01-23 | 1981-01-23 | Manufacture magnetic bubble device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57122508A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59112487A (en) * | 1982-12-20 | 1984-06-28 | Fujitsu Ltd | Manufacture of bubble memory device |
EP0154524A2 (en) * | 1984-03-03 | 1985-09-11 | Fujitsu Limited | Process for manufacturing a magnetic bubble memory chip |
-
1981
- 1981-01-23 JP JP863181A patent/JPS57122508A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59112487A (en) * | 1982-12-20 | 1984-06-28 | Fujitsu Ltd | Manufacture of bubble memory device |
JPS6228511B2 (en) * | 1982-12-20 | 1987-06-20 | Fujitsu Ltd | |
EP0154524A2 (en) * | 1984-03-03 | 1985-09-11 | Fujitsu Limited | Process for manufacturing a magnetic bubble memory chip |
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