JPS57108851A - Formation of resist image - Google Patents

Formation of resist image

Info

Publication number
JPS57108851A
JPS57108851A JP55184588A JP18458880A JPS57108851A JP S57108851 A JPS57108851 A JP S57108851A JP 55184588 A JP55184588 A JP 55184588A JP 18458880 A JP18458880 A JP 18458880A JP S57108851 A JPS57108851 A JP S57108851A
Authority
JP
Japan
Prior art keywords
benzyl acetate
polymer
resist
beams
aromatic rings
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP55184588A
Other languages
English (en)
Japanese (ja)
Other versions
JPS647651B2 (enExample
Inventor
Yoshitake Onishi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP55184588A priority Critical patent/JPS57108851A/ja
Publication of JPS57108851A publication Critical patent/JPS57108851A/ja
Publication of JPS647651B2 publication Critical patent/JPS647651B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/325—Non-aqueous compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP55184588A 1980-12-25 1980-12-25 Formation of resist image Granted JPS57108851A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP55184588A JPS57108851A (en) 1980-12-25 1980-12-25 Formation of resist image

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55184588A JPS57108851A (en) 1980-12-25 1980-12-25 Formation of resist image

Publications (2)

Publication Number Publication Date
JPS57108851A true JPS57108851A (en) 1982-07-07
JPS647651B2 JPS647651B2 (enExample) 1989-02-09

Family

ID=16155827

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55184588A Granted JPS57108851A (en) 1980-12-25 1980-12-25 Formation of resist image

Country Status (1)

Country Link
JP (1) JPS57108851A (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6055630A (ja) * 1983-09-06 1985-03-30 Oki Electric Ind Co Ltd レジストパタ−ンの形成方法
EP2309331A1 (en) * 2009-10-09 2011-04-13 Flexoclean Engineering B.V. A polymer washout solvent and the use thereof for developing a flexographic printing plate
WO2011093980A1 (en) * 2010-01-28 2011-08-04 Eastman Kodak Company Flexographic processing solution and use

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6055630A (ja) * 1983-09-06 1985-03-30 Oki Electric Ind Co Ltd レジストパタ−ンの形成方法
EP2309331A1 (en) * 2009-10-09 2011-04-13 Flexoclean Engineering B.V. A polymer washout solvent and the use thereof for developing a flexographic printing plate
WO2011042225A1 (en) * 2009-10-09 2011-04-14 Flexoclean Engineering B.V. A polymer washout solvent, and the use thereof for developing a flexographic printing plate
US8921035B2 (en) 2009-10-09 2014-12-30 Flexoclean Engineering B.V. Polymer washout solvent, and the use thereof for developing a flexographic printing plate
WO2011093980A1 (en) * 2010-01-28 2011-08-04 Eastman Kodak Company Flexographic processing solution and use
US8632961B2 (en) 2010-01-28 2014-01-21 Eastman Kodak Company Flexographic processing solution and use

Also Published As

Publication number Publication date
JPS647651B2 (enExample) 1989-02-09

Similar Documents

Publication Publication Date Title
JPS5299776A (en) Radiation sensitive high polymeric material
JPS57108851A (en) Formation of resist image
JPS55148423A (en) Method of pattern formation
JPS5512500A (en) Partial pressure meter of oxygen
JPS5518673A (en) Ionized radiation sensitive negative type resist
JPS55156941A (en) Micropattern forming method
JPS5515149A (en) Forming method of resist for microfabrication
JPS5726170A (en) Formation of al or al alloy pattern
JPS5670547A (en) Minute pattern forming method
JPS5621328A (en) Method of making pattern
JPS5786832A (en) Pattern forming material
JPS5674245A (en) Pattern forming method
JPS53130033A (en) Electron beam sensitive material
JPS5643634A (en) Negative type resist material
JPS5649524A (en) Manufacture of semiconductor device
JPS57115832A (en) Resist pattern formation for fine processing
JPS5558243A (en) Highly sensitive positive resist composition
SU1246762A1 (ru) Способ обработки носител дл записи информации
JPS5655943A (en) Pattern forming method
JPS55110243A (en) Production of resist image
JPS61160935A (ja) Ｘ線露光方法
JPS5623744A (en) Resist pattern forming method
JPS53131771A (en) Production of etching resistant polymer mask
JPS56137348A (en) Negative type ionized radiation sensitive resist
JPS5636135A (en) Manufacture of resist image