JPS57103317A - Method for patterning - Google Patents

Method for patterning

Info

Publication number
JPS57103317A
JPS57103317A JP17955180A JP17955180A JPS57103317A JP S57103317 A JPS57103317 A JP S57103317A JP 17955180 A JP17955180 A JP 17955180A JP 17955180 A JP17955180 A JP 17955180A JP S57103317 A JPS57103317 A JP S57103317A
Authority
JP
Japan
Prior art keywords
light
coating
layer
permeability
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP17955180A
Other languages
Japanese (ja)
Inventor
Moritaka Nakamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP17955180A priority Critical patent/JPS57103317A/en
Publication of JPS57103317A publication Critical patent/JPS57103317A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Electron Beam Exposure (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To facilitate forming fine patterns by making exposure to light after depositing a layer of novolak or the like which has less permeability to gases but higher permeability to electron beams when negative type resist coatings are exposed to light under vacuum. CONSTITUTION:Negative type resist coating 3 is applied on an SiO2 layer 2 deposited on a semiconductor substrate 1 in order to make the coating 3 a desired pattern by exposing it to light. For this, the procedure described below is to be followed. A layer 4 of novolak, polyvinylidene chloride or polychlorotrifluoroethylene is formed to expose the coating 3 to light through this layer which has less permeability to gases but higher permeability to exposure light beams instead of exposing the coating 3 direct to light. By such a procedure, variation of layer thickness and deviation from design dimensions of the patterns can be minimized as the coating 3 is isolated from oxygen in the air so that operating rate of the exposure light system for fine patterning can be increased.
JP17955180A 1980-12-18 1980-12-18 Method for patterning Pending JPS57103317A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17955180A JPS57103317A (en) 1980-12-18 1980-12-18 Method for patterning

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17955180A JPS57103317A (en) 1980-12-18 1980-12-18 Method for patterning

Publications (1)

Publication Number Publication Date
JPS57103317A true JPS57103317A (en) 1982-06-26

Family

ID=16067716

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17955180A Pending JPS57103317A (en) 1980-12-18 1980-12-18 Method for patterning

Country Status (1)

Country Link
JP (1) JPS57103317A (en)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4841941A (en) * 1971-10-04 1973-06-19
JPS507910A (en) * 1973-05-29 1975-01-27
JPS53128277A (en) * 1977-04-14 1978-11-09 Fujitsu Ltd Projection exposure method for negative resist
JPS561941A (en) * 1979-06-20 1981-01-10 Chiyou Lsi Gijutsu Kenkyu Kumiai Image forming method

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4841941A (en) * 1971-10-04 1973-06-19
JPS507910A (en) * 1973-05-29 1975-01-27
JPS53128277A (en) * 1977-04-14 1978-11-09 Fujitsu Ltd Projection exposure method for negative resist
JPS561941A (en) * 1979-06-20 1981-01-10 Chiyou Lsi Gijutsu Kenkyu Kumiai Image forming method

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