JPS5690561A - Manufacture of semiconductor device - Google Patents

Manufacture of semiconductor device

Info

Publication number
JPS5690561A
JPS5690561A JP16732779A JP16732779A JPS5690561A JP S5690561 A JPS5690561 A JP S5690561A JP 16732779 A JP16732779 A JP 16732779A JP 16732779 A JP16732779 A JP 16732779A JP S5690561 A JPS5690561 A JP S5690561A
Authority
JP
Japan
Prior art keywords
sio2
type
layer
base
etched
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP16732779A
Other languages
English (en)
Other versions
JPS6220711B2 (ja
Inventor
Akira Sato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP16732779A priority Critical patent/JPS5690561A/ja
Publication of JPS5690561A publication Critical patent/JPS5690561A/ja
Publication of JPS6220711B2 publication Critical patent/JPS6220711B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/02Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/06Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
    • H01L29/10Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions with semiconductor regions connected to an electrode not carrying current to be rectified, amplified or switched and such electrode being part of a semiconductor device which comprises three or more electrodes
    • H01L29/1004Base region of bipolar transistors

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Bipolar Transistors (AREA)
JP16732779A 1979-12-22 1979-12-22 Manufacture of semiconductor device Granted JPS5690561A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16732779A JPS5690561A (en) 1979-12-22 1979-12-22 Manufacture of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16732779A JPS5690561A (en) 1979-12-22 1979-12-22 Manufacture of semiconductor device

Publications (2)

Publication Number Publication Date
JPS5690561A true JPS5690561A (en) 1981-07-22
JPS6220711B2 JPS6220711B2 (ja) 1987-05-08

Family

ID=15847684

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16732779A Granted JPS5690561A (en) 1979-12-22 1979-12-22 Manufacture of semiconductor device

Country Status (1)

Country Link
JP (1) JPS5690561A (ja)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58169971A (ja) * 1982-03-30 1983-10-06 Fujitsu Ltd 半導体装置およびその製造方法
JPS5961179A (ja) * 1982-09-30 1984-04-07 Fujitsu Ltd バイポ−ラ半導体装置の製造方法
EP0199061A2 (en) * 1985-03-23 1986-10-29 Itt Industries, Inc. Semiconductor devices

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0666822U (ja) * 1993-03-01 1994-09-20 トヨタ車体株式会社 ダイクッションピンの圧力制御装置

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53123083A (en) * 1977-04-01 1978-10-27 Nippon Telegr & Teleph Corp <Ntt> Production of semiconductor device

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53123083A (en) * 1977-04-01 1978-10-27 Nippon Telegr & Teleph Corp <Ntt> Production of semiconductor device

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58169971A (ja) * 1982-03-30 1983-10-06 Fujitsu Ltd 半導体装置およびその製造方法
JPH0247853B2 (ja) * 1982-03-30 1990-10-23 Fujitsu Ltd
JPS5961179A (ja) * 1982-09-30 1984-04-07 Fujitsu Ltd バイポ−ラ半導体装置の製造方法
EP0199061A2 (en) * 1985-03-23 1986-10-29 Itt Industries, Inc. Semiconductor devices
EP0202727A2 (en) * 1985-03-23 1986-11-26 Northern Telecom Europe Limited Semiconductor devices
EP0199061A3 (en) * 1985-03-23 1988-03-30 Itt Industries, Inc. Semiconductor devices

Also Published As

Publication number Publication date
JPS6220711B2 (ja) 1987-05-08

Similar Documents

Publication Publication Date Title
US4253888A (en) Pretreatment of photoresist masking layers resulting in higher temperature device processing
JP3026656B2 (ja) 薄膜抵抗体の製造方法
US3432920A (en) Semiconductor devices and methods of making them
US3472688A (en) Resistor element and method for manufacturing the same
JPS5690561A (en) Manufacture of semiconductor device
JPS5643749A (en) Semiconductor device and its manufacture
JPS5745947A (en) Mos type semiconductor integrated circuit
JPS56130960A (en) Manufacture of semiconductor integrated circuit
JPS57134956A (en) Manufacture of semiconductor integrated circuit
JPS5515231A (en) Manufacturing method of semiconductor device
JPS562651A (en) Manufacture of semiconductor device
JPS56153766A (en) Semiconductor device
JPS5740956A (en) Semiconductor device
JPS57207374A (en) Manufacture of semiconductor device
JPS5784147A (en) Manufacture of integrated circuit
JPS5780768A (en) Semiconductor device
KR100380253B1 (ko) 산화알루미늄을이용한저항소자형성방법
JPS56135964A (en) Semiconductor device
KR890002990A (ko) 바이폴라 트랜지스터의 제조방법
JPS5591872A (en) Manufacture of semiconductor device
JPS5693315A (en) Manufacture of semiconductor device
JPS6430264A (en) Manufacture of semiconductor device
JPS56135966A (en) Manufacture of semiconductor device
JPS5718320A (en) Production of semiconductor device
JPS5753941A (ja) Handotaisochi