JPS568827A - Semiconductor device - Google Patents

Semiconductor device

Info

Publication number
JPS568827A
JPS568827A JP8515179A JP8515179A JPS568827A JP S568827 A JPS568827 A JP S568827A JP 8515179 A JP8515179 A JP 8515179A JP 8515179 A JP8515179 A JP 8515179A JP S568827 A JPS568827 A JP S568827A
Authority
JP
Japan
Prior art keywords
film
substrate
mask
sio2
region
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8515179A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0235465B2 (enrdf_load_stackoverflow
Inventor
Hiromichi Kono
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP8515179A priority Critical patent/JPS568827A/ja
Publication of JPS568827A publication Critical patent/JPS568827A/ja
Publication of JPH0235465B2 publication Critical patent/JPH0235465B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02107—Forming insulating materials on a substrate
    • H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
    • H01L21/02112—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer
    • H01L21/02123—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon
    • H01L21/0217—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon the material being a silicon nitride not containing oxygen, e.g. SixNy or SixByNz

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Local Oxidation Of Silicon (AREA)
  • Bipolar Transistors (AREA)
  • Element Separation (AREA)
JP8515179A 1979-07-04 1979-07-04 Semiconductor device Granted JPS568827A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8515179A JPS568827A (en) 1979-07-04 1979-07-04 Semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8515179A JPS568827A (en) 1979-07-04 1979-07-04 Semiconductor device

Publications (2)

Publication Number Publication Date
JPS568827A true JPS568827A (en) 1981-01-29
JPH0235465B2 JPH0235465B2 (enrdf_load_stackoverflow) 1990-08-10

Family

ID=13850656

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8515179A Granted JPS568827A (en) 1979-07-04 1979-07-04 Semiconductor device

Country Status (1)

Country Link
JP (1) JPS568827A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6530511B2 (en) 2001-02-13 2003-03-11 Medallion Technology, Llc Wire feed mechanism and method used for fabricating electrical connectors

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5444870A (en) * 1977-09-16 1979-04-09 Chiyou Lsi Gijutsu Kenkyu Kumiai Manufacture of semiconductor device
JPS5458381A (en) * 1977-10-19 1979-05-11 Seiko Epson Corp Manufacture for semiconductor device
JPS5479571A (en) * 1977-12-07 1979-06-25 Nec Corp Bipolar transistor

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5444870A (en) * 1977-09-16 1979-04-09 Chiyou Lsi Gijutsu Kenkyu Kumiai Manufacture of semiconductor device
JPS5458381A (en) * 1977-10-19 1979-05-11 Seiko Epson Corp Manufacture for semiconductor device
JPS5479571A (en) * 1977-12-07 1979-06-25 Nec Corp Bipolar transistor

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6530511B2 (en) 2001-02-13 2003-03-11 Medallion Technology, Llc Wire feed mechanism and method used for fabricating electrical connectors

Also Published As

Publication number Publication date
JPH0235465B2 (enrdf_load_stackoverflow) 1990-08-10

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