JPS5688135A - Developer - Google Patents

Developer

Info

Publication number
JPS5688135A
JPS5688135A JP16557579A JP16557579A JPS5688135A JP S5688135 A JPS5688135 A JP S5688135A JP 16557579 A JP16557579 A JP 16557579A JP 16557579 A JP16557579 A JP 16557579A JP S5688135 A JPS5688135 A JP S5688135A
Authority
JP
Japan
Prior art keywords
isobutyl acetate
acetate
film
developed
soln
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP16557579A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6360376B2 (enrdf_load_stackoverflow
Inventor
Hiroshi Shiraishi
Saburo Nonogaki
Kiyotake Naraoka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP16557579A priority Critical patent/JPS5688135A/ja
Publication of JPS5688135A publication Critical patent/JPS5688135A/ja
Publication of JPS6360376B2 publication Critical patent/JPS6360376B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/325—Non-aqueous compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP16557579A 1979-12-21 1979-12-21 Developer Granted JPS5688135A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16557579A JPS5688135A (en) 1979-12-21 1979-12-21 Developer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16557579A JPS5688135A (en) 1979-12-21 1979-12-21 Developer

Publications (2)

Publication Number Publication Date
JPS5688135A true JPS5688135A (en) 1981-07-17
JPS6360376B2 JPS6360376B2 (enrdf_load_stackoverflow) 1988-11-24

Family

ID=15814954

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16557579A Granted JPS5688135A (en) 1979-12-21 1979-12-21 Developer

Country Status (1)

Country Link
JP (1) JPS5688135A (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6139041A (ja) * 1984-07-31 1986-02-25 Tokyo Ohka Kogyo Co Ltd ポジ型レジスト現像液
JPS62175739A (ja) * 1986-01-30 1987-08-01 Toshiba Corp パタ−ン形成方法
JPH0328851A (ja) * 1988-05-24 1991-02-07 Toppan Printing Co Ltd 電子ビームレジストのパターン形成方法

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6139041A (ja) * 1984-07-31 1986-02-25 Tokyo Ohka Kogyo Co Ltd ポジ型レジスト現像液
JPS62175739A (ja) * 1986-01-30 1987-08-01 Toshiba Corp パタ−ン形成方法
JPH0328851A (ja) * 1988-05-24 1991-02-07 Toppan Printing Co Ltd 電子ビームレジストのパターン形成方法

Also Published As

Publication number Publication date
JPS6360376B2 (enrdf_load_stackoverflow) 1988-11-24

Similar Documents

Publication Publication Date Title
JPS5635130A (en) Resist material and method for forming resist pattern
JPS5688135A (en) Developer
JPS5483846A (en) Diffusing plate
JPS55118633A (en) Exposing method for electron beam
JPS57106128A (en) Forming method for pattern
JPS5677843A (en) Resist pattern forming method
JPS52149978A (en) Developing treatment method of photoresist film
JPS57157247A (en) Optical exposure mask
JPS5267623A (en) Exposure adjusting mechanism for simplified camera
JPS52146217A (en) Positive type radiation sensitive material
JPS5619045A (en) Electron beam sensitive inorganic resist
JPS558013A (en) Semiconductor device manufacturing method
JPS5429976A (en) Manufacture of semiconductor device
JPS5421271A (en) Pattern forming method
JPS55134847A (en) Manufacture of resist image
JPS5621328A (en) Method of making pattern
JPS5558243A (en) Highly sensitive positive resist composition
JPS578541A (en) Positive type resist material
ES480802A1 (es) Procedimiento de fabricacion de articulos con capas protec- toras sensibles a la radiacion.
JPS5616126A (en) Exposing method
JPS54145126A (en) Pattern formation material
JPS5353975A (en) Electronic beam exposure device
JPS5346266A (en) Electronic microscope
JPS56114942A (en) High energy beam sensitive resist material and its using method
JPS5639536A (en) Ionizing radiation sensitive resist