JPS5680185A - Manufacture of josephson junction element - Google Patents

Manufacture of josephson junction element

Info

Publication number
JPS5680185A
JPS5680185A JP15849379A JP15849379A JPS5680185A JP S5680185 A JPS5680185 A JP S5680185A JP 15849379 A JP15849379 A JP 15849379A JP 15849379 A JP15849379 A JP 15849379A JP S5680185 A JPS5680185 A JP S5680185A
Authority
JP
Japan
Prior art keywords
layer
resist
josephson junction
pattern
junction element
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP15849379A
Other languages
Japanese (ja)
Inventor
Yoji Masuko
Hayaaki Fukumoto
Masahiko Denda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP15849379A priority Critical patent/JPS5680185A/en
Publication of JPS5680185A publication Critical patent/JPS5680185A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00Superconducting devices
    • H10N60/01Manufacture or treatment
    • H10N60/0912Manufacture or treatment of Josephson-effect devices

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Superconductor Devices And Manufacturing Methods Thereof (AREA)

Abstract

PURPOSE:To enable the preparation of a junction section of a microbridge type Josephson junction element in excellent controllability by using the ionic injection of superconductive substance. CONSTITUTION:An SiO2 layer 2 is formed on an Si substrate 1, and an Nb layer 3 is made up on the SiO2 layer 2. A resist is further built up on the Nb layer 3. A pattern of the resist is formed, the Nb layer 3 is etched using the resist as a mask, the resist is removed, and a pattern of the Nb layer 3 is made up. Ions such as Nb ions are injected from a surface to form an Nb ion injection layer 7, and a Josephson junction using the layer 7 as a superconductive weak coupling section is made up. Thus, the stable pattern is built up without needing not more than 1mum photolithography, and a junction section can be prepared in excellent controllability.
JP15849379A 1979-12-05 1979-12-05 Manufacture of josephson junction element Pending JPS5680185A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15849379A JPS5680185A (en) 1979-12-05 1979-12-05 Manufacture of josephson junction element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15849379A JPS5680185A (en) 1979-12-05 1979-12-05 Manufacture of josephson junction element

Publications (1)

Publication Number Publication Date
JPS5680185A true JPS5680185A (en) 1981-07-01

Family

ID=15672940

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15849379A Pending JPS5680185A (en) 1979-12-05 1979-12-05 Manufacture of josephson junction element

Country Status (1)

Country Link
JP (1) JPS5680185A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5256897A (en) * 1988-11-28 1993-10-26 Hitachi, Ltd. Oxide superconducting device
WO2000016413A1 (en) * 1998-09-14 2000-03-23 Commonwealth Scientific And Industrial Research Organisation Superconducting device
CN104342627A (en) * 2014-09-25 2015-02-11 昆明理工大学 Surface strengthening treatment method for pure copper material

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5256897A (en) * 1988-11-28 1993-10-26 Hitachi, Ltd. Oxide superconducting device
WO2000016413A1 (en) * 1998-09-14 2000-03-23 Commonwealth Scientific And Industrial Research Organisation Superconducting device
CN104342627A (en) * 2014-09-25 2015-02-11 昆明理工大学 Surface strengthening treatment method for pure copper material

Similar Documents

Publication Publication Date Title
JPS5673446A (en) Manufacture of semiconductor device
JPS5680185A (en) Manufacture of josephson junction element
JPS54136141A (en) Magnetic bubble memory element and its manufacture
JPS57143826A (en) Formation of resist pattern on gapped semiconductor substrate
JPS5723239A (en) Manufacture of semiconductor device
JPS5528077A (en) Production of mask
JPS54157478A (en) Alignment method
JPS5619045A (en) Electron beam sensitive inorganic resist
JPS5478980A (en) Anisotropic etching method
JPS5661163A (en) Preparation of charge connecting element
JPS57145327A (en) Manufacture of semiconductor device
JPS5667979A (en) Preparation method of josephson element
JPS5646582A (en) Formation of pattern of filmlike article
JPS5626462A (en) Resistor and the manufacturing process
JPS54122973A (en) Manufacture for semiconductor device
JPS56162838A (en) Manufacture of semiconductor device
JPS5534433A (en) Preparation of semiconductor device
JPS5646581A (en) Formation of pattern of niobium film
JPS5553421A (en) Composite mask for ion etching
JPS577150A (en) Manufacture of semiconductor device
JPS5475275A (en) Manufacture of semiconductor device
JPS5591128A (en) Formation of fine electrode pattern
JPS5593226A (en) Forming method of material picture
JPS54122982A (en) Manufacture for complementary mos integrated circuit device
JPS5621331A (en) Manufcture of semiconductor device