JPS5593226A - Forming method of material picture - Google Patents

Abstract

PURPOSE: To obtain a minute pattern without producing an under cut in a picture by a method wherein a pair of partition walls corresponding to the width of a minute picture to be obtained is formed on a substrate, and a material film for forming the minute picture is left behind between the walls.

CONSTITUTION: Two partition walls 6 with the interval l and the width d are formed on the substrate 1 by means of a resist picture and a material film 2 for the minute picture to be obtained is applied to the whole surface. The film 2e is made to exist in the interval of the partition walls 6; the film 2f is made to exist on the wall 6; and the film 2g is made to wxist on the other area wxcept these areas on the substrate. Next thereto, the wall 6 together with the film 2f thereupon are removed by means of the resist exfoliating liquid and making use of the space produced on the site from which the wall 6 is removed, the exposed surface and the lateral face of the film 2e are wrapped in the etching resist 7. Thereafter, making this a mask, the film 2g is removed with the etching liquid capable of solving only the film 2g and the resist 7 is removed, thus making the minute picture 4 made of the film 2e remaining the disired width t.

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