JPS5679430A - Manufacture of semiconductor integrated circuit device - Google Patents

Manufacture of semiconductor integrated circuit device

Info

Publication number
JPS5679430A
JPS5679430A JP15661979A JP15661979A JPS5679430A JP S5679430 A JPS5679430 A JP S5679430A JP 15661979 A JP15661979 A JP 15661979A JP 15661979 A JP15661979 A JP 15661979A JP S5679430 A JPS5679430 A JP S5679430A
Authority
JP
Japan
Prior art keywords
pattern
substrate
photo
transfer
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15661979A
Other languages
English (en)
Japanese (ja)
Other versions
JPS641928B2 (enrdf_load_stackoverflow
Inventor
Yoji Yamanaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHIYOU LSI GIJUTSU KENKYU KUMIAI
Original Assignee
CHIYOU LSI GIJUTSU KENKYU KUMIAI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHIYOU LSI GIJUTSU KENKYU KUMIAI filed Critical CHIYOU LSI GIJUTSU KENKYU KUMIAI
Priority to JP15661979A priority Critical patent/JPS5679430A/ja
Publication of JPS5679430A publication Critical patent/JPS5679430A/ja
Publication of JPS641928B2 publication Critical patent/JPS641928B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP15661979A 1979-12-03 1979-12-03 Manufacture of semiconductor integrated circuit device Granted JPS5679430A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15661979A JPS5679430A (en) 1979-12-03 1979-12-03 Manufacture of semiconductor integrated circuit device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15661979A JPS5679430A (en) 1979-12-03 1979-12-03 Manufacture of semiconductor integrated circuit device

Publications (2)

Publication Number Publication Date
JPS5679430A true JPS5679430A (en) 1981-06-30
JPS641928B2 JPS641928B2 (enrdf_load_stackoverflow) 1989-01-13

Family

ID=15631670

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15661979A Granted JPS5679430A (en) 1979-12-03 1979-12-03 Manufacture of semiconductor integrated circuit device

Country Status (1)

Country Link
JP (1) JPS5679430A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113334754A (zh) * 2021-07-01 2021-09-03 唐汉聪 一种油墨印刷纸表面覆膜工艺

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH077927U (ja) * 1993-07-20 1995-02-03 大英産業株式会社 日除けシート
JPH0719701U (ja) * 1993-09-13 1995-04-07 東京メガネ製造株式会社 曇止めシール

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS505105A (enrdf_load_stackoverflow) * 1973-05-15 1975-01-20
JPS5322370A (en) * 1976-08-13 1978-03-01 Fujitsu Ltd Inspecting method of semiconductor device
JPS5431282A (en) * 1977-08-12 1979-03-08 Mitsubishi Electric Corp Pattern formation method

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS505105A (enrdf_load_stackoverflow) * 1973-05-15 1975-01-20
JPS5322370A (en) * 1976-08-13 1978-03-01 Fujitsu Ltd Inspecting method of semiconductor device
JPS5431282A (en) * 1977-08-12 1979-03-08 Mitsubishi Electric Corp Pattern formation method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113334754A (zh) * 2021-07-01 2021-09-03 唐汉聪 一种油墨印刷纸表面覆膜工艺

Also Published As

Publication number Publication date
JPS641928B2 (enrdf_load_stackoverflow) 1989-01-13

Similar Documents

Publication Publication Date Title
EP0810475A3 (en) Pattern exposing method using phase shift and mask used therefor
IT8267548A0 (it) Procedimento ed apparecchiatura per l esposizione di uno strato di gelatina fotosensibile depositate su un substrato particolarmente per la fabbricazione di dispositivi elettronici a semiconduttori
JPS5679430A (en) Manufacture of semiconductor integrated circuit device
KR100284348B1 (ko) 포토레지스트도포웨이퍼의저장방법및레지스트패턴의형성방법
JPH1197328A (ja) レジストパターンの形成方法
JP2000031025A (ja) レジストパターンの形成方法
JPS57183030A (en) Manufacture of semiconductor device
JPS57100428A (en) Method for photomechanical process
JPS57186329A (en) Exposing method
JPS5541728A (en) Pattern formation by thick film paste
JPS5339060A (en) Lot number marking method to wafers
JP2676833B2 (ja) フォトレジストパターンの形成方法
JPS51114931A (en) Photoresist pattern formation method
JPS533821A (en) Exposure method
SU1046804A1 (ru) Способ контрол точности совмещени при микролитографии
JPS62279628A (ja) 樹脂膜の形成方法
JPS5763829A (en) Pattern forming method
GB1334377A (en) Method of photographic transfer
JPS55108737A (en) Method for manufacture of semiconductor device
JPS5616126A (en) Exposing method
JPS5558534A (en) Manufacture of semiconductor device
JPS6473616A (en) Manufacture of semiconductor device
KR960005804A (ko) 웨이퍼 노광방법
JPS5329720A (en) Developing device for diazo photo-sensitive paper
JPS5689741A (en) Dryplate for photomasking