JPS5678128A - Manufacture of semiconductor element - Google Patents
Manufacture of semiconductor elementInfo
- Publication number
- JPS5678128A JPS5678128A JP15430979A JP15430979A JPS5678128A JP S5678128 A JPS5678128 A JP S5678128A JP 15430979 A JP15430979 A JP 15430979A JP 15430979 A JP15430979 A JP 15430979A JP S5678128 A JPS5678128 A JP S5678128A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- substrate
- diffused
- lifetime
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 title abstract 2
- 238000004519 manufacturing process Methods 0.000 title 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 4
- 239000000758 substrate Substances 0.000 abstract 4
- 101000617707 Homo sapiens Pregnancy-specific beta-1-glycoprotein 11 Proteins 0.000 abstract 2
- 102100022023 Pregnancy-specific beta-1-glycoprotein 11 Human genes 0.000 abstract 2
- 230000015572 biosynthetic process Effects 0.000 abstract 2
- 229910052681 coesite Inorganic materials 0.000 abstract 2
- 229910052906 cristobalite Inorganic materials 0.000 abstract 2
- 229910001385 heavy metal Inorganic materials 0.000 abstract 2
- 230000003647 oxidation Effects 0.000 abstract 2
- 238000007254 oxidation reaction Methods 0.000 abstract 2
- 239000000377 silicon dioxide Substances 0.000 abstract 2
- 235000012239 silicon dioxide Nutrition 0.000 abstract 2
- 229910052682 stishovite Inorganic materials 0.000 abstract 2
- 229910052905 tridymite Inorganic materials 0.000 abstract 2
- 239000011248 coating agent Substances 0.000 abstract 1
- 238000000576 coating method Methods 0.000 abstract 1
- 238000009792 diffusion process Methods 0.000 abstract 1
- 238000010438 heat treatment Methods 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/324—Thermal treatment for modifying the properties of semiconductor bodies, e.g. annealing, sintering
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Bipolar Transistors (AREA)
- Thyristors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15430979A JPS5678128A (en) | 1979-11-30 | 1979-11-30 | Manufacture of semiconductor element |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15430979A JPS5678128A (en) | 1979-11-30 | 1979-11-30 | Manufacture of semiconductor element |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5678128A true JPS5678128A (en) | 1981-06-26 |
| JPS6119104B2 JPS6119104B2 (enrdf_load_stackoverflow) | 1986-05-15 |
Family
ID=15581292
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15430979A Granted JPS5678128A (en) | 1979-11-30 | 1979-11-30 | Manufacture of semiconductor element |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5678128A (enrdf_load_stackoverflow) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005311126A (ja) * | 2004-04-22 | 2005-11-04 | Shin Etsu Handotai Co Ltd | ｐ型シリコン単結晶ウェーハ及びその製造方法 |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0178703U (enrdf_load_stackoverflow) * | 1987-11-17 | 1989-05-26 | ||
| JPH05346102A (ja) * | 1992-06-11 | 1993-12-27 | Sailor Pen Co Ltd:The | 垂直エアシリンダの制御方法 |
-
1979
- 1979-11-30 JP JP15430979A patent/JPS5678128A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005311126A (ja) * | 2004-04-22 | 2005-11-04 | Shin Etsu Handotai Co Ltd | ｐ型シリコン単結晶ウェーハ及びその製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6119104B2 (enrdf_load_stackoverflow) | 1986-05-15 |
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