JPS5673915A - Manufacture for quartz oscillator - Google Patents
Manufacture for quartz oscillatorInfo
- Publication number
- JPS5673915A JPS5673915A JP15050879A JP15050879A JPS5673915A JP S5673915 A JPS5673915 A JP S5673915A JP 15050879 A JP15050879 A JP 15050879A JP 15050879 A JP15050879 A JP 15050879A JP S5673915 A JPS5673915 A JP S5673915A
- Authority
- JP
- Japan
- Prior art keywords
- mask
- layer
- quartz
- substance layer
- substance
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000010453 quartz Substances 0.000 title abstract 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title abstract 7
- 238000004519 manufacturing process Methods 0.000 title 1
- 239000000126 substance Substances 0.000 abstract 7
- 239000000758 substrate Substances 0.000 abstract 3
- 239000003795 chemical substances by application Substances 0.000 abstract 2
- 238000000034 method Methods 0.000 abstract 2
Classifications
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/02—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks
Abstract
PURPOSE:To save the process of substrate rinsing, by providing a mask substance layer on one side of quartz substance with the 1st process and providing a substance layer having the conductivity and withstanding the quartz processing agent on it and a resist layer further on it. CONSTITUTION:The 1st mask substance layer 4 is coated on a quartz substrate 1, the 2nd mask substane layer 5 is coated on it, and the resist layer 3 is coated further on it. The 2nd mask substance layer 5 is selectively removed to form the electrode pattern. The resist layer 3 is again provided, and the substrate 1 is formed to the shape of quartz oscillator with a quartz processing agent. Next, the 1st mask substance layer 4 is selectively removed by taking the 2nd mask substance layer 5 as a mask to constitute the quartz oscillator having the electrodes 4 and 5.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15050879A JPS5673915A (en) | 1979-11-20 | 1979-11-20 | Manufacture for quartz oscillator |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15050879A JPS5673915A (en) | 1979-11-20 | 1979-11-20 | Manufacture for quartz oscillator |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5673915A true JPS5673915A (en) | 1981-06-19 |
Family
ID=15498391
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15050879A Pending JPS5673915A (en) | 1979-11-20 | 1979-11-20 | Manufacture for quartz oscillator |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5673915A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5954309A (en) * | 1982-09-22 | 1984-03-29 | Seiko Epson Corp | Manufacture of crystal oscillator |
-
1979
- 1979-11-20 JP JP15050879A patent/JPS5673915A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5954309A (en) * | 1982-09-22 | 1984-03-29 | Seiko Epson Corp | Manufacture of crystal oscillator |
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