JPS5662323A - Reticle examination method - Google Patents
Reticle examination methodInfo
- Publication number
- JPS5662323A JPS5662323A JP13848079A JP13848079A JPS5662323A JP S5662323 A JPS5662323 A JP S5662323A JP 13848079 A JP13848079 A JP 13848079A JP 13848079 A JP13848079 A JP 13848079A JP S5662323 A JPS5662323 A JP S5662323A
- Authority
- JP
- Japan
- Prior art keywords
- pattern
- reticle
- chip pattern
- row
- chip
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13848079A JPS5662323A (en) | 1979-10-26 | 1979-10-26 | Reticle examination method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13848079A JPS5662323A (en) | 1979-10-26 | 1979-10-26 | Reticle examination method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5662323A true JPS5662323A (en) | 1981-05-28 |
| JPS6131610B2 JPS6131610B2 (OSRAM) | 1986-07-21 |
Family
ID=15223050
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13848079A Granted JPS5662323A (en) | 1979-10-26 | 1979-10-26 | Reticle examination method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5662323A (OSRAM) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5679431A (en) * | 1979-12-03 | 1981-06-30 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Manufacture of semiconductor integrated circuit device |
| JPS58210618A (ja) * | 1982-06-02 | 1983-12-07 | Hitachi Ltd | 縮小投影露光方法および装置 |
| JPS6216528A (ja) * | 1985-07-16 | 1987-01-24 | Hoya Corp | Ａｌ膜付き基板 |
| JPS6337617A (ja) * | 1985-10-31 | 1988-02-18 | インターナシヨナル・ビジネス・マシーンズ・コーポレーシヨン | レティクルの欠陥検出方法 |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6327212U (OSRAM) * | 1986-07-29 | 1988-02-23 |
-
1979
- 1979-10-26 JP JP13848079A patent/JPS5662323A/ja active Granted
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5679431A (en) * | 1979-12-03 | 1981-06-30 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Manufacture of semiconductor integrated circuit device |
| JPS58210618A (ja) * | 1982-06-02 | 1983-12-07 | Hitachi Ltd | 縮小投影露光方法および装置 |
| JPS6216528A (ja) * | 1985-07-16 | 1987-01-24 | Hoya Corp | Ａｌ膜付き基板 |
| JPS6337617A (ja) * | 1985-10-31 | 1988-02-18 | インターナシヨナル・ビジネス・マシーンズ・コーポレーシヨン | レティクルの欠陥検出方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6131610B2 (OSRAM) | 1986-07-21 |
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