JPS5661169A - Preparation of compound semiconductor device - Google Patents
Preparation of compound semiconductor deviceInfo
- Publication number
- JPS5661169A JPS5661169A JP13700879A JP13700879A JPS5661169A JP S5661169 A JPS5661169 A JP S5661169A JP 13700879 A JP13700879 A JP 13700879A JP 13700879 A JP13700879 A JP 13700879A JP S5661169 A JPS5661169 A JP S5661169A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- mask
- electrode
- film
- type gaas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/80—FETs having rectifying junction gate electrodes
Landscapes
- Electrodes Of Semiconductors (AREA)
- Junction Field-Effect Transistors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13700879A JPS5661169A (en) | 1979-10-25 | 1979-10-25 | Preparation of compound semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13700879A JPS5661169A (en) | 1979-10-25 | 1979-10-25 | Preparation of compound semiconductor device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5661169A true JPS5661169A (en) | 1981-05-26 |
JPS6154265B2 JPS6154265B2 (enrdf_load_stackoverflow) | 1986-11-21 |
Family
ID=15188645
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13700879A Granted JPS5661169A (en) | 1979-10-25 | 1979-10-25 | Preparation of compound semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5661169A (enrdf_load_stackoverflow) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5998559A (ja) * | 1982-11-27 | 1984-06-06 | Matsushita Electric Ind Co Ltd | 電界効果トランジスタ |
JPS6037784A (ja) * | 1983-08-10 | 1985-02-27 | Matsushita Electric Ind Co Ltd | 電界効果型トランジスタ |
US4824800A (en) * | 1987-05-08 | 1989-04-25 | Mitsubishi Denki Kabushiki Kaisha | Method of fabricating semiconductor devices |
US5270228A (en) * | 1991-02-14 | 1993-12-14 | Mitsubishi Denki Kabushiki Kaisha | Method of fabricating gate electrode in recess |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02154147A (ja) * | 1988-12-06 | 1990-06-13 | Hitachi Constr Mach Co Ltd | 超音波探触子 |
-
1979
- 1979-10-25 JP JP13700879A patent/JPS5661169A/ja active Granted
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5998559A (ja) * | 1982-11-27 | 1984-06-06 | Matsushita Electric Ind Co Ltd | 電界効果トランジスタ |
JPS6037784A (ja) * | 1983-08-10 | 1985-02-27 | Matsushita Electric Ind Co Ltd | 電界効果型トランジスタ |
US4824800A (en) * | 1987-05-08 | 1989-04-25 | Mitsubishi Denki Kabushiki Kaisha | Method of fabricating semiconductor devices |
US5270228A (en) * | 1991-02-14 | 1993-12-14 | Mitsubishi Denki Kabushiki Kaisha | Method of fabricating gate electrode in recess |
Also Published As
Publication number | Publication date |
---|---|
JPS6154265B2 (enrdf_load_stackoverflow) | 1986-11-21 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS5661169A (en) | Preparation of compound semiconductor device | |
JPS5599744A (en) | Manufacture of semiconductor device | |
JPS5627972A (en) | Manufacture of compound semiconductor device | |
JPS56155531A (en) | Manufacture of semiconductor device | |
JPS57204175A (en) | Manufacture of semiconductor device | |
JPS56100482A (en) | Manufacture of fet | |
JPS5612788A (en) | Manufacture of semiconductor element | |
JPS54124687A (en) | Production of semiconductor device | |
JPS57180184A (en) | Manufacturing method for fet | |
JPS57188884A (en) | Formation of recessed minute multilayer gate electrode | |
JPS5586161A (en) | Manufacture of semiconductor device | |
JPS54139486A (en) | Manufacture of semiconductor device | |
JPS54106174A (en) | Semiconductor device and its manufacture | |
JPS57124443A (en) | Forming method for electrode layer | |
JPS5784168A (en) | Semiconductor device | |
JPS5673474A (en) | Manufacture of semiconductor device | |
JPS5578568A (en) | Manufacture of semiconductor device | |
JPS57211275A (en) | Manufacture of schottky barrier gate type field-effect transistor | |
JPS5567140A (en) | Method for manufacturing semiconductor device | |
JPS5613731A (en) | Manufacture of semiconductor device | |
JPS57199231A (en) | Manufacture of semiconductor device | |
JPS61137371A (ja) | 半導体装置の製造方法 | |
JPS5627974A (en) | Manufacture of compound semiconductor device | |
JPS57188883A (en) | Formation of recess-type micro-multilayer gate electrode | |
JPS5529174A (en) | Manufacturing of triac |