JPS5651580A - Plasma etching method - Google Patents

Plasma etching method

Info

Publication number
JPS5651580A
JPS5651580A JP12531879A JP12531879A JPS5651580A JP S5651580 A JPS5651580 A JP S5651580A JP 12531879 A JP12531879 A JP 12531879A JP 12531879 A JP12531879 A JP 12531879A JP S5651580 A JPS5651580 A JP S5651580A
Authority
JP
Japan
Prior art keywords
contg
gas
subjecting
plasma etching
heat treatment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12531879A
Other languages
English (en)
Japanese (ja)
Other versions
JPS628512B2 (zh
Inventor
Yukio Tanuma
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP12531879A priority Critical patent/JPS5651580A/ja
Publication of JPS5651580A publication Critical patent/JPS5651580A/ja
Publication of JPS628512B2 publication Critical patent/JPS628512B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)
JP12531879A 1979-10-01 1979-10-01 Plasma etching method Granted JPS5651580A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12531879A JPS5651580A (en) 1979-10-01 1979-10-01 Plasma etching method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12531879A JPS5651580A (en) 1979-10-01 1979-10-01 Plasma etching method

Publications (2)

Publication Number Publication Date
JPS5651580A true JPS5651580A (en) 1981-05-09
JPS628512B2 JPS628512B2 (zh) 1987-02-23

Family

ID=14907132

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12531879A Granted JPS5651580A (en) 1979-10-01 1979-10-01 Plasma etching method

Country Status (1)

Country Link
JP (1) JPS5651580A (zh)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59110119A (ja) * 1982-12-15 1984-06-26 Nec Corp 半導体層の表面処理方法
JPS59201426A (ja) * 1983-04-29 1984-11-15 Sony Corp 半導体基体の処理方法
JPS61147530A (ja) * 1984-12-21 1986-07-05 Toshiba Corp 配線形成方法
JPS6466544A (en) * 1987-09-08 1989-03-13 Fuji Photo Film Co Ltd Chemical analyzer
JPH01206620A (ja) * 1988-02-15 1989-08-18 Toshiba Corp 半導体装置の製造方法
WO2017110335A1 (ja) * 2015-12-25 2017-06-29 東京エレクトロン株式会社 基板処理方法

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63243615A (ja) * 1987-03-31 1988-10-11 Matsushita Electric Ind Co Ltd 液体燃料燃焼装置

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59110119A (ja) * 1982-12-15 1984-06-26 Nec Corp 半導体層の表面処理方法
JPS59201426A (ja) * 1983-04-29 1984-11-15 Sony Corp 半導体基体の処理方法
JPS61147530A (ja) * 1984-12-21 1986-07-05 Toshiba Corp 配線形成方法
JPS6466544A (en) * 1987-09-08 1989-03-13 Fuji Photo Film Co Ltd Chemical analyzer
JPH01206620A (ja) * 1988-02-15 1989-08-18 Toshiba Corp 半導体装置の製造方法
WO2017110335A1 (ja) * 2015-12-25 2017-06-29 東京エレクトロン株式会社 基板処理方法
KR20180084094A (ko) * 2015-12-25 2018-07-24 도쿄엘렉트론가부시키가이샤 기판 처리 방법
CN108475632A (zh) * 2015-12-25 2018-08-31 东京毅力科创株式会社 基板处理方法
TWI695428B (zh) * 2015-12-25 2020-06-01 日商東京威力科創股份有限公司 基板處理方法
US10910229B2 (en) 2015-12-25 2021-02-02 Tokyo Electron Limited Substrate treatment method
CN108475632B (zh) * 2015-12-25 2023-04-04 东京毅力科创株式会社 基板处理方法

Also Published As

Publication number Publication date
JPS628512B2 (zh) 1987-02-23

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