JPS5638458A - Formation of resist pattern - Google Patents

Formation of resist pattern

Info

Publication number
JPS5638458A
JPS5638458A JP11281179A JP11281179A JPS5638458A JP S5638458 A JPS5638458 A JP S5638458A JP 11281179 A JP11281179 A JP 11281179A JP 11281179 A JP11281179 A JP 11281179A JP S5638458 A JPS5638458 A JP S5638458A
Authority
JP
Japan
Prior art keywords
copper
polymer
contact
intermediate object
resist pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11281179A
Other languages
English (en)
Inventor
Tsuneo Yoshino
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toray Industries Inc
Original Assignee
Toray Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toray Industries Inc filed Critical Toray Industries Inc
Priority to JP11281179A priority Critical patent/JPS5638458A/ja
Publication of JPS5638458A publication Critical patent/JPS5638458A/ja
Pending legal-status Critical Current

Links

JP11281179A 1979-09-05 1979-09-05 Formation of resist pattern Pending JPS5638458A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11281179A JPS5638458A (en) 1979-09-05 1979-09-05 Formation of resist pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11281179A JPS5638458A (en) 1979-09-05 1979-09-05 Formation of resist pattern

Publications (1)

Publication Number Publication Date
JPS5638458A true JPS5638458A (en) 1981-04-13

Family

ID=14596117

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11281179A Pending JPS5638458A (en) 1979-09-05 1979-09-05 Formation of resist pattern

Country Status (1)

Country Link
JP (1) JPS5638458A (ja)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57192420A (en) * 1981-04-27 1982-11-26 Hitachi Chem Co Ltd Photopolymer composition
JPS5876827A (ja) * 1981-10-30 1983-05-10 Hitachi Chem Co Ltd 感光性樹脂組成物
JPS58102230A (ja) * 1981-12-15 1983-06-17 Hitachi Chem Co Ltd 感光性樹脂組成物
US5326245A (en) * 1992-06-26 1994-07-05 International Business Machines Corporation Apparatus for extruding materials that exhibit anisotropic properties due to molecular or fibril orientation as a result of the extrusion process

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57192420A (en) * 1981-04-27 1982-11-26 Hitachi Chem Co Ltd Photopolymer composition
JPH0411856B2 (ja) * 1981-04-27 1992-03-02 Hitachi Chemical Co Ltd
JPS5876827A (ja) * 1981-10-30 1983-05-10 Hitachi Chem Co Ltd 感光性樹脂組成物
JPH045981B2 (ja) * 1981-10-30 1992-02-04 Hitachi Chemical Co Ltd
JPS58102230A (ja) * 1981-12-15 1983-06-17 Hitachi Chem Co Ltd 感光性樹脂組成物
JPH0334056B2 (ja) * 1981-12-15 1991-05-21 Hitachi Chemical Co Ltd
US5326245A (en) * 1992-06-26 1994-07-05 International Business Machines Corporation Apparatus for extruding materials that exhibit anisotropic properties due to molecular or fibril orientation as a result of the extrusion process

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