JPS5638458A - Formation of resist pattern - Google Patents
Formation of resist patternInfo
- Publication number
- JPS5638458A JPS5638458A JP11281179A JP11281179A JPS5638458A JP S5638458 A JPS5638458 A JP S5638458A JP 11281179 A JP11281179 A JP 11281179A JP 11281179 A JP11281179 A JP 11281179A JP S5638458 A JPS5638458 A JP S5638458A
- Authority
- JP
- Japan
- Prior art keywords
- copper
- polymer
- contact
- intermediate object
- resist pattern
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11281179A JPS5638458A (en) | 1979-09-05 | 1979-09-05 | Formation of resist pattern |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11281179A JPS5638458A (en) | 1979-09-05 | 1979-09-05 | Formation of resist pattern |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5638458A true JPS5638458A (en) | 1981-04-13 |
Family
ID=14596117
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11281179A Pending JPS5638458A (en) | 1979-09-05 | 1979-09-05 | Formation of resist pattern |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5638458A (ja) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57192420A (en) * | 1981-04-27 | 1982-11-26 | Hitachi Chem Co Ltd | Photopolymer composition |
JPS5876827A (ja) * | 1981-10-30 | 1983-05-10 | Hitachi Chem Co Ltd | 感光性樹脂組成物 |
JPS58102230A (ja) * | 1981-12-15 | 1983-06-17 | Hitachi Chem Co Ltd | 感光性樹脂組成物 |
US5326245A (en) * | 1992-06-26 | 1994-07-05 | International Business Machines Corporation | Apparatus for extruding materials that exhibit anisotropic properties due to molecular or fibril orientation as a result of the extrusion process |
-
1979
- 1979-09-05 JP JP11281179A patent/JPS5638458A/ja active Pending
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57192420A (en) * | 1981-04-27 | 1982-11-26 | Hitachi Chem Co Ltd | Photopolymer composition |
JPH0411856B2 (ja) * | 1981-04-27 | 1992-03-02 | Hitachi Chemical Co Ltd | |
JPS5876827A (ja) * | 1981-10-30 | 1983-05-10 | Hitachi Chem Co Ltd | 感光性樹脂組成物 |
JPH045981B2 (ja) * | 1981-10-30 | 1992-02-04 | Hitachi Chemical Co Ltd | |
JPS58102230A (ja) * | 1981-12-15 | 1983-06-17 | Hitachi Chem Co Ltd | 感光性樹脂組成物 |
JPH0334056B2 (ja) * | 1981-12-15 | 1991-05-21 | Hitachi Chemical Co Ltd | |
US5326245A (en) * | 1992-06-26 | 1994-07-05 | International Business Machines Corporation | Apparatus for extruding materials that exhibit anisotropic properties due to molecular or fibril orientation as a result of the extrusion process |
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