JPS5636134A - Forming method for pattern of semiconductor substrate - Google Patents
Forming method for pattern of semiconductor substrateInfo
- Publication number
- JPS5636134A JPS5636134A JP11164979A JP11164979A JPS5636134A JP S5636134 A JPS5636134 A JP S5636134A JP 11164979 A JP11164979 A JP 11164979A JP 11164979 A JP11164979 A JP 11164979A JP S5636134 A JPS5636134 A JP S5636134A
- Authority
- JP
- Japan
- Prior art keywords
- film
- pattern
- polymethyl methacrylate
- methacrylate
- resist
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 title abstract 3
- 238000000034 method Methods 0.000 title abstract 2
- 239000004065 semiconductor Substances 0.000 title abstract 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 abstract 4
- 239000004926 polymethyl methacrylate Substances 0.000 abstract 4
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 abstract 2
- 229920001577 copolymer Polymers 0.000 abstract 2
- 230000015572 biosynthetic process Effects 0.000 abstract 1
- 238000001039 wet etching Methods 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/094—Multilayer resist systems, e.g. planarising layers
Landscapes
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11164979A JPS5636134A (en) | 1979-09-03 | 1979-09-03 | Forming method for pattern of semiconductor substrate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11164979A JPS5636134A (en) | 1979-09-03 | 1979-09-03 | Forming method for pattern of semiconductor substrate |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5636134A true JPS5636134A (en) | 1981-04-09 |
| JPS6152567B2 JPS6152567B2 (enrdf_load_stackoverflow) | 1986-11-13 |
Family
ID=14566667
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11164979A Granted JPS5636134A (en) | 1979-09-03 | 1979-09-03 | Forming method for pattern of semiconductor substrate |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5636134A (enrdf_load_stackoverflow) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59125624A (ja) * | 1982-12-29 | 1984-07-20 | Fujitsu Ltd | パタ−ン形成方法 |
| JPS60106132A (ja) * | 1983-11-15 | 1985-06-11 | Fujitsu Ltd | パタ−ン形成方法 |
-
1979
- 1979-09-03 JP JP11164979A patent/JPS5636134A/ja active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59125624A (ja) * | 1982-12-29 | 1984-07-20 | Fujitsu Ltd | パタ−ン形成方法 |
| JPS60106132A (ja) * | 1983-11-15 | 1985-06-11 | Fujitsu Ltd | パタ−ン形成方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6152567B2 (enrdf_load_stackoverflow) | 1986-11-13 |
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