JPS5627927A - Location in electron beam injection - Google Patents

Location in electron beam injection

Info

Publication number
JPS5627927A
JPS5627927A JP10275979A JP10275979A JPS5627927A JP S5627927 A JPS5627927 A JP S5627927A JP 10275979 A JP10275979 A JP 10275979A JP 10275979 A JP10275979 A JP 10275979A JP S5627927 A JPS5627927 A JP S5627927A
Authority
JP
Japan
Prior art keywords
standard marks
marks
electron beam
location
wafer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10275979A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6244686B2 (enrdf_load_stackoverflow
Inventor
Yasunobu Kawachi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP10275979A priority Critical patent/JPS5627927A/ja
Publication of JPS5627927A publication Critical patent/JPS5627927A/ja
Publication of JPS6244686B2 publication Critical patent/JPS6244686B2/ja
Granted legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Analytical Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Electron Beam Exposure (AREA)
JP10275979A 1979-08-14 1979-08-14 Location in electron beam injection Granted JPS5627927A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10275979A JPS5627927A (en) 1979-08-14 1979-08-14 Location in electron beam injection

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10275979A JPS5627927A (en) 1979-08-14 1979-08-14 Location in electron beam injection

Publications (2)

Publication Number Publication Date
JPS5627927A true JPS5627927A (en) 1981-03-18
JPS6244686B2 JPS6244686B2 (enrdf_load_stackoverflow) 1987-09-22

Family

ID=14336118

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10275979A Granted JPS5627927A (en) 1979-08-14 1979-08-14 Location in electron beam injection

Country Status (1)

Country Link
JP (1) JPS5627927A (enrdf_load_stackoverflow)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6074519A (ja) * 1983-09-30 1985-04-26 Fujitsu Ltd 電子ビ−ム露光における試料の位置合せ方法
US5185679A (en) * 1988-05-12 1993-02-09 Mitsubishi Denki Kabushiki Kaisha Inversion phenomenon preventing circuit
US5461339A (en) * 1992-04-23 1995-10-24 Mitsubishi Denki Kabushiki Kaisha Apparatus for processing frequency modulated signals
EP3101679A1 (en) * 2015-05-31 2016-12-07 FEI Company Dynamic creation of backup fiducials

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4856377A (enrdf_load_stackoverflow) * 1971-11-17 1973-08-08
JPS5277670A (en) * 1975-12-24 1977-06-30 Seiko Epson Corp Semiconductive device

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4856377A (enrdf_load_stackoverflow) * 1971-11-17 1973-08-08
JPS5277670A (en) * 1975-12-24 1977-06-30 Seiko Epson Corp Semiconductive device

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6074519A (ja) * 1983-09-30 1985-04-26 Fujitsu Ltd 電子ビ−ム露光における試料の位置合せ方法
US5185679A (en) * 1988-05-12 1993-02-09 Mitsubishi Denki Kabushiki Kaisha Inversion phenomenon preventing circuit
US5461339A (en) * 1992-04-23 1995-10-24 Mitsubishi Denki Kabushiki Kaisha Apparatus for processing frequency modulated signals
EP3101679A1 (en) * 2015-05-31 2016-12-07 FEI Company Dynamic creation of backup fiducials
CN106206224A (zh) * 2015-05-31 2016-12-07 Fei 公司 备用基准的动态创建
KR20160141371A (ko) * 2015-05-31 2016-12-08 에프이아이 컴파니 백업 기점들의 동적 생성
US9619728B2 (en) 2015-05-31 2017-04-11 Fei Company Dynamic creation of backup fiducials
TWI713075B (zh) * 2015-05-31 2020-12-11 美商Fei公司 對準用於處理之一帶電粒子射束之方法，用於形成一薄板以用於穿透式電子檢視之方法，及用於一樣本之帶電粒子射束處理之設備

Also Published As

Publication number Publication date
JPS6244686B2 (enrdf_load_stackoverflow) 1987-09-22

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