JPS57194530A - Positioning of photomask substrate - Google Patents
Positioning of photomask substrateInfo
- Publication number
- JPS57194530A JPS57194530A JP56079389A JP7938981A JPS57194530A JP S57194530 A JPS57194530 A JP S57194530A JP 56079389 A JP56079389 A JP 56079389A JP 7938981 A JP7938981 A JP 7938981A JP S57194530 A JPS57194530 A JP S57194530A
- Authority
- JP
- Japan
- Prior art keywords
- mask
- mark
- detection
- matching mark
- grid line
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
PURPOSE:To quickly perform the detection of a mask-matching mark by a method wherein marks to be used for detection of the mask-matching mark are provided on the grid line of the photomask substrate. CONSTITUTION:The grid line 2 is arranged on a photomask 1, and the mask- matching mark 4 is formed in a chip region 3. Then, the mask-matching mark detection marks 5 and 6 are formed on the grid line in the direction of X and Y axis from the mask-matching mark. In order to detect the mask-matching mark quickly, the visual field 7 of an alignment scope is shifted on the grid line, the mask-matching mark detection mark is caught in the visual field, and then the visual field is shifted in the direction orthogonally intersecting with the detection mark.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56079389A JPS57194530A (en) | 1981-05-27 | 1981-05-27 | Positioning of photomask substrate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56079389A JPS57194530A (en) | 1981-05-27 | 1981-05-27 | Positioning of photomask substrate |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57194530A true JPS57194530A (en) | 1982-11-30 |
JPS6148252B2 JPS6148252B2 (en) | 1986-10-23 |
Family
ID=13688501
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP56079389A Granted JPS57194530A (en) | 1981-05-27 | 1981-05-27 | Positioning of photomask substrate |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57194530A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1126507A3 (en) * | 2000-02-14 | 2002-07-24 | Shinko Electric Industries Co. Ltd. | Apparatus for positioning a thin plate |
-
1981
- 1981-05-27 JP JP56079389A patent/JPS57194530A/en active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1126507A3 (en) * | 2000-02-14 | 2002-07-24 | Shinko Electric Industries Co. Ltd. | Apparatus for positioning a thin plate |
Also Published As
Publication number | Publication date |
---|---|
JPS6148252B2 (en) | 1986-10-23 |
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